Inventor
NAKAFUJI SHIN-YA
JP17 patents
⚠️ This page may combine multiple inventors who share the name “NAKAFUJI SHIN-YA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
15 patentsUS9400429B2Jul 26, 2016
Composition for forming a resist underlayer film, and pattern-forming method
JSR CORP7 citations82
US9620378B1Apr 11, 2017
Composition for film formation, film, production method of patterned substrate, and compound
JSR CORP2 citations71
US8871432B2Oct 28, 2014
Pattern-forming method, resist underlayer film, and composition for forming resist underlayer film
JSR CORP4 citations71
US9581905B2Feb 28, 2017
Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound
JSR CORP6 citations68
US9170493B2Oct 27, 2015
Resist underlayer film-forming composition, pattern-forming method and resist underlayer film
JSR CORP3 citations61
US9090119B2Jul 28, 2015
Pattern forming method
JSR CORP3 citations61
US9447303B2Sep 20, 2016
Composition for forming resist underlayer film
JSR CORP0 citations51
US12265333B2Apr 1, 2025
Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound
JSR CORP0 citations50
US11880138B2Jan 23, 2024
Composition, pattern-forming method, and compound-producing method
JSR CORP0 citations50
US11126084B2Sep 21, 2021
Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound
JSR CORP0 citations50
US9696626B2Jul 4, 2017
Composition for forming a resist underlayer film, and pattern-forming method
JSR CORP0 citations50
US9091922B2Jul 28, 2015
Resin composition, resist underlayer film, resist underlayer film-forming method and pattern-forming method
JSR CORP1 citations46
US10053539B2Aug 21, 2018
Composition for film formation, film, production method of patterned substrate, and compound
JSR CORP0 citations40
US9134611B2Sep 15, 2015
Composition for forming resist underlayer film and pattern-forming method
JSR CORP0 citations40
US10146131B2Dec 4, 2018
Composition, method for producing patterned substrate, film and forming method thereof, and compound
JSR CORP0 citations37