Inventor
WAKAMATSU GOUJI
JP18 patents
⚠️ This page may combine multiple inventors who share the name “WAKAMATSU GOUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
13 patentsUS9400429B2Jul 26, 2016
Composition for forming a resist underlayer film, and pattern-forming method
JSR CORP7 citations82
US11681222B2Jun 20, 2023
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
JSR CORP0 citations61
US11036133B2Jun 15, 2021
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
JSR CORP0 citations61
US11003079B2May 11, 2021
Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound
JSR CORP1 citations60
US8697344B2Apr 15, 2014
Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern
JSR CORP2 citations60
US8808974B2Aug 19, 2014
Method for forming pattern
JSR CORP2 citations59
US10620534B2Apr 14, 2020
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
JSR CORP0 citations51
US10082733B2Sep 25, 2018
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
JSR CORP0 citations51
US9500950B2Nov 22, 2016
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
JSR CORP0 citations51
US9213236B2Dec 15, 2015
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
JSR CORP0 citations51
US9029067B2May 12, 2015
Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same
JSR CORP0 citations51
US9696626B2Jul 4, 2017
Composition for forming a resist underlayer film, and pattern-forming method
JSR CORP0 citations50
US10146131B2Dec 4, 2018
Composition, method for producing patterned substrate, film and forming method thereof, and compound
JSR CORP0 citations37