Inventor
HOSHINO TOMOHISA
JP17 patents
⚠️ This page may combine multiple inventors who share the name “HOSHINO TOMOHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
16 patentsUS6747465B2Jun 8, 2004
Contractor, method for manufacturing the same, and probe card using the same
TOKYO ELECTRON LTD27 citations92
US7827932B2Nov 9, 2010
Vaporizer and processor
TOKYO ELECTRON LTD16 citations83
US6893953B2May 17, 2005
Fabrication process of a semiconductor device including a CVD process of a metal film
TOKYO ELECTRON LTD16 citations82
US7891090B2Feb 22, 2011
Method for manufacturing an interposer
TOKYO ELECTRON LTD2 citations62
US7619424B2Nov 17, 2009
Probe needle, method for manufacturing the probe needle and method for constructing a three-dimensional structure
TOKYO ELECTRON LTD4 citations62
US7866038B2Jan 11, 2011
Through substrate, interposer and manufacturing method of through substrate
TOKYO ELECTRON LTD3 citations61
US7323220B2Jan 29, 2008
Gas phase growth system, method of operating the system, and vaporizer for the system
TOKYO ELECTRON LTD3 citations61
US7692434B2Apr 6, 2010
Probe and method for fabricating the same
TOKYO ELECTRON LTD5 citations60
US11427920B2Aug 30, 2022
Electrolytic processing jig and electrolytic processing method
TOKYO ELECTRON LTD0 citations51
US11427921B2Aug 30, 2022
Electrolytic treatment apparatus and electrolytic treatment method
TOKYO ELECTRON LTD0 citations51
US10354915B2Jul 16, 2019
Adhesion layer forming method, adhesion layer forming system and recording medium
TOKYO ELECTRON LTD0 citations51
US11542627B2Jan 3, 2023
Electrolytic processing jig and electrolytic processing method
TOKYO ELECTRON LTD0 citations50
US11111592B2Sep 7, 2021
Manufacturing apparatus and manufacturing method for semiconductor device
TOKYO ELECTRON LTD0 citations50
US10903081B2Jan 26, 2021
Substrate processing method
TOKYO ELECTRON LTD0 citations50
US10428438B2Oct 1, 2019
Substrate processing method and template
TOKYO ELECTRON LTD0 citations40
US10392719B2Aug 27, 2019
Electrolytic treatment apparatus and electrolytic treatment method
TOKYO ELECTRON LTD0 citations40