Inventor

MEISSL MARIO JOHANNES

US35 patents

⚠️ This page may combine multiple inventors who share the name “MEISSL MARIO JOHANNES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MEISSL MARIO JOHANNES

CANON KK

Imprint apparatus and method of imprinting a partial field

Adaptive chucking system

Method and system for imprint force control

Superstrate chuck, method of use, and method of manufacturing an article

Method for improving accuracy of imprint force application in imprint lithography

Method of determining the initial contact point for partial fields and method of shaping a surface

Template replication

Systems and methods for reducing pressure while shaping a film

Systems and methods for curing a shaped film

Template replication

Overlay improvement in nanoimprint lithography

Imprint apparatus, control method, imprint method and manufacturing method

System and method for shaping a film with a scaled calibration measurement parameter

Apparatus and method for improving accuracy of imprint force application in imprint lithography

Imprint apparatus control, control method and manufacturing method

Real-time correction of template deformation in nanoimprint lithography

Overlay improvement in nanoimprint lithography

System and method for generating control values for overlay control of an imprint tool

Apparatus including a bonding head and a method of using the same

Exposure apparatus for uniform light intensity and methods of using the same

Apparatus for uniform light intensity and methods of using the same

Nanoimprint lithography with a six degrees-of-freedom imprint head module

MOLECULAR IMPRINTS INC

Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template

Step and repeat imprint lithography processes

Strain and kinetics control during separation phase of imprint process

Safe separation for nano imprinting

Template having a silicon nitride, silicon carbide or silicon oxynitride film

GANAPATHISUBRAMANIAN MAHADEVAN

Imprint lithography system and method

Chucking system with recessed support feature

CANON NANOTECHNOLOGIES INC

Chucking system with recessed support feature

Low contact imprint lithography template chuck system for improved overlay correction

KHUSNATDINOV NIYAZ

Strain and kinetics control during separation phase of imprint process

RESNICK DOUGLAS J

Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template

IM SE-HYUK

Safe separation for nano imprinting

SREENIVASAN SIDLGATA V

Step and repeat imprint lithography process