Inventor
HAGIWARA KAZUYUKI
JP16 patents
⚠️ This page may combine multiple inventors who share the name “HAGIWARA KAZUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
D2S INC
12 patentsUS7759027B2Jul 20, 2010
Method and system for design of a reticle to be manufactured using character projection lithography
D2S INC48 citations94
US9043734B2May 26, 2015
Method and system for forming high accuracy patterns using charged particle beam lithography
D2S INC13 citations92
US7759026B2Jul 20, 2010
Method and system for manufacturing a reticle using character projection particle beam lithography
D2S INC25 citations92
US7745078B2Jun 29, 2010
Method and system for manufacturing a reticle using character projection lithography
D2S INC17 citations92
US9343267B2May 17, 2016
Method and system for dimensional uniformity using charged particle beam lithography
D2S INC12 citations84
US9859100B2Jan 2, 2018
Method and system for dimensional uniformity using charged particle beam lithography
D2S INC3 citations73
US9612530B2Apr 4, 2017
Method and system for design of enhanced edge slope patterns for charged particle beam lithography
D2S INC4 citations72
US8959463B2Feb 17, 2015
Method and system for dimensional uniformity using charged particle beam lithography
D2S INC5 citations72
US8865377B2Oct 21, 2014
Method and system for forming a diagonal pattern using charged particle beam lithography
D2S INC3 citations62
US10431422B2Oct 1, 2019
Method and system for dimensional uniformity using charged particle beam lithography
D2S INC0 citations52
US7901845B2Mar 8, 2011
Method for optical proximity correction of a reticle to be manufactured using character projection lithography
D2S INC0 citations52
US8949750B2Feb 3, 2015
Method and system for forming a diagonal pattern using charged particle beam lithography
D2S INC0 citations41