Inventor

GODET LUDOVIC

US247 patents

⚠️ This page may combine multiple inventors who share the name “GODET LUDOVIC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GODET LUDOVIC

APPLIED MATERIALS INC

Anisotropic gap etch

Development of high etch selective hardmask material by ion implantation into amorphous carbon films

Method and apparatus for post exposure processing of photoresist wafers

Post exposure processing apparatus

Optical component having depth modulated angled gratings and method of formation

Integrated cluster tool for selective area deposition

System and method for detecting etch depth of angled surface relief gratings

Method and apparatus for post exposure processing of photoresist wafers

Methods for gapfill in high aspect ratio structures

Selective deposition process utilizing polymer structure deactivation process

Immersion field guided exposure and post-exposure bake process

Field guided post exposure bake application for photoresist microbridge defects

Controlling photo acid diffusion in lithography processes

Advanced process flow for high quality FCVD films

Localized stress modulation for overlay and EPE

Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layer

Plasma poisoning to enable selective deposition

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Electric/magnetic field guided acid profile control in a photoresist layer

Field guided exposure and post-exposure bake process

Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications

Method and apparatus for selective deposition

Electric/magnetic field guided acid diffusion

Imaging system and method of creating composite images

Full-field metrology tool for waveguide combiners and meta-surfaces

Method of forming gratings

Depth-modulated slanted gratings using gray-tone lithography and slant etch

Fabrication of diffraction gratings

VARIAN SEMICONDUCTOR EQUIPMENT

Ion source

Technique for monitoring and controlling a plasma process

Closed loop control and process optimization in plasma doping processes using a time of flight ion detector

Apparatus and techniques for energetic neutral beam processing

Technique for forming a FinFET device using selective ion implantation

Apparatus and method for controllably implanting workpieces

Method and system for controlling critical dimension and roughness in resist features

Technique for monitoring and controlling a plasma process

In situ control of ion angular distribution in a processing apparatus

Monitoring plasma ion implantation systems for fault detection and process control

GODET LUDOVIC

Method of etching a workpiece

Plasma processing apparatus

Technique and apparatus for monitoring ion mass, energy, and angle in processing systems

Method and system for modifying patterned photoresist using multi-step ion implantation

Plasma processing apparatus

Method and system for post-etch treatment of patterned substrate features

Method and system for modifying photoresist using electromagnetic radiation and ion implantation

Ion source

Enhanced etch and deposition profile control using plasma sheath engineering

PAPASOULIOTIS GEORGE D

Techniques for plasma processing a substrate

MILLER TIMOTHY J

Apparatus and method for three dimensional ion processing

YIEH ELLIE

Method and system for three-dimensional (3D) structure fill