Inventor
YONEZAWA MASATO
JP38 patents
⚠️ This page may combine multiple inventors who share the name “YONEZAWA MASATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMICONDUCTOR ENERGY LAB
23 patentsUS7030551B2Apr 18, 2006
Area sensor and display apparatus provided with an area sensor
SEMICONDUCTOR ENERGY LAB148 citations99
US6027960AFeb 22, 2000
Laser annealing method and laser annealing device
SEMICONDUCTOR ENERGY LAB146 citations99
US6846696B2Jan 25, 2005
Method for manufacturing solar battery
SEMICONDUCTOR ENERGY LAB73 citations98
US6444506B1Sep 3, 2002
Method of manufacturing silicon thin film devices using laser annealing in a hydrogen mixture gas followed by nitride formation
SEMICONDUCTOR ENERGY LAB114 citations98
US6743700B2Jun 1, 2004
Semiconductor film, semiconductor device and method of their production
SEMICONDUCTOR ENERGY LAB48 citations96
US6348369B1Feb 19, 2002
Method for manufacturing semiconductor devices
SEMICONDUCTOR ENERGY LAB63 citations96
US7786544B2Aug 31, 2010
Area sensor and display apparatus provided with an area sensor
SEMICONDUCTOR ENERGY LAB13 citations93
US7041580B2May 9, 2006
Laser annealing method and laser annealing device
SEMICONDUCTOR ENERGY LAB15 citations93
US6825492B2Nov 30, 2004
Method of manufacturing a semiconductor device
SEMICONDUCTOR ENERGY LAB28 citations93
US6692984B2Feb 17, 2004
Method of manufacturing a semiconductor device
SEMICONDUCTOR ENERGY LAB49 citations93
US6827787B2Dec 7, 2004
Conveyor device and film formation apparatus for a flexible substrate
SEMICONDUCTOR ENERGY LAB35 citations92
US6620288B2Sep 16, 2003
Substrate treatment apparatus
SEMICONDUCTOR ENERGY LAB31 citations92
US7528057B2May 5, 2009
Laser annealing method and laser annealing device
SEMICONDUCTOR ENERGY LAB11 citations84
US7351605B2Apr 1, 2008
Method of manufacturing a semiconductor device
SEMICONDUCTOR ENERGY LAB14 citations84
US7594479B2Sep 29, 2009
Plasma CVD device and discharge electrode
SEMICONDUCTOR ENERGY LAB7 citations74
US7384828B2Jun 10, 2008
Semiconductor film, semiconductor device and method of their production
SEMICONDUCTOR ENERGY LAB8 citations74
US7365004B2Apr 29, 2008
Method for manufacturing semiconductor device
SEMICONDUCTOR ENERGY LAB8 citations74
US8378443B2Feb 19, 2013
Area sensor and display apparatus provided with an area sensor
SEMICONDUCTOR ENERGY LAB2 citations63
US7510901B2Mar 31, 2009
Conveyor device and film formation apparatus for a flexible substrate
SEMICONDUCTOR ENERGY LAB1 citations63
US9941343B2Apr 10, 2018
Area sensor and display apparatus provided with an area sensor
SEMICONDUCTOR ENERGY LAB0 citations52
US9711582B2Jul 18, 2017
Area sensor and display apparatus provided with an area sensor
SEMICONDUCTOR ENERGY LAB0 citations52
US9337243B2May 10, 2016
Area sensor and display apparatus provided with an area sensor
SEMICONDUCTOR ENERGY LAB0 citations52
US9082677B2Jul 14, 2015
Area sensor and display apparatus provided with an area sensor
SEMICONDUCTOR ENERGY LAB0 citations52
TOKYO ELECTRON LTD
8 patentsUS9376751B2Jun 28, 2016
Plasma processing device and operation method
TOKYO ELECTRON LTD3 citations73
US10668512B2Jun 2, 2020
Particle removal method and substrate processing method
TOKYO ELECTRON LTD1 citations62
US11390948B2Jul 19, 2022
Film forming apparatus
TOKYO ELECTRON LTD0 citations60
US7462376B2Dec 9, 2008
CVD method for forming silicon nitride film
TOKYO ELECTRON LTD4 citations60
US10103009B2Oct 16, 2018
Plasma processing device and operation method
TOKYO ELECTRON LTD0 citations52
US10385453B2Aug 20, 2019
Film forming apparatus
TOKYO ELECTRON LTD0 citations49
US11328901B2May 10, 2022
Deposition method
TOKYO ELECTRON LTD0 citations47
US9865454B2Jan 9, 2018
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations42