Inventor
YAEGASHI HIDETAMI
JP40 patents
⚠️ This page may combine multiple inventors who share the name “YAEGASHI HIDETAMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
34 patentsUS6565928B2May 20, 2003
Film forming method and film forming apparatus
TOKYO ELECTRON LTD91 citations98
US6054181AApr 25, 2000
Method of substrate processing to form a film on multiple target objects
TOKYO ELECTRON LTD106 citations98
US5964954AOct 12, 1999
Double-sided substrate cleaning apparatus and cleaning method using the same
TOKYO ELECTRON LTD119 citations98
US5565034AOct 15, 1996
Apparatus for processing substrates having a film formed on a surface of the substrate
TOKYO ELECTRON LTD216 citations98
US5518542AMay 21, 1996
Double-sided substrate cleaning apparatus
TOKYO ELECTRON LTD265 citations98
US5876280AMar 2, 1999
Substrate treating system and substrate treating method
TOKYO ELECTRON LTD91 citations97
US5725664AMar 10, 1998
Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections
TOKYO ELECTRON LTD87 citations95
US6287023B1Sep 11, 2001
Processing apparatus and method
TOKYO ELECTRON LTD60 citations94
US6518199B2Feb 11, 2003
Method and system for coating and developing
TOKYO ELECTRON LTD31 citations93
US6284044B1Sep 4, 2001
Film forming method and film forming apparatus
TOKYO ELECTRON LTD38 citations92
US6097469AAug 1, 2000
Method of processing resist onto substrate and resist processing apparatus
TOKYO ELECTRON LTD24 citations92
US6017663AJan 25, 2000
Method of processing resist utilizing alkaline component monitoring
TOKYO ELECTRON LTD25 citations92
US5932380AAug 3, 1999
Method of processing resist utilizing alkaline component monitoring
TOKYO ELECTRON LTD29 citations92
US5928390AJul 27, 1999
Vertical processing apparatus
TOKYO ELECTRON LTD45 citations92
US5686143ANov 11, 1997
Resist treating method
TOKYO ELECTRON LTD31 citations92
US9418860B2Aug 16, 2016
Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
TOKYO ELECTRON LTD12 citations91
US6884298B2Apr 26, 2005
Method and system for coating and developing
TOKYO ELECTRON LTD6 citations74
US9690185B2Jun 27, 2017
Substrate processing method, program, computer-readable storage medium, and substrate processing system
TOKYO ELECTRON LTD4 citations73
US10366888B2Jul 30, 2019
Pattern forming method
TOKYO ELECTRON LTD3 citations72
US7367710B2May 6, 2008
Developing solution supply nozzle with stirrer
TOKYO ELECTRON LTD7 citations71
US9023225B2May 5, 2015
Pattern forming method
TOKYO ELECTRON LTD2 citations62
US10211050B2Feb 19, 2019
Method for photo-lithographic processing in semiconductor device manufacturing
TOKYO ELECTRON LTD1 citations61
US7846648B2Dec 7, 2010
Substrate developing method, substrate processing method and developing solution supply nozzle
TOKYO ELECTRON LTD2 citations60
US11205571B2Dec 21, 2021
Mask forming method
TOKYO ELECTRON LTD0 citations59
US11467497B2Oct 11, 2022
Method of forming mask
TOKYO ELECTRON LTD0 citations52
US10573530B2Feb 25, 2020
Pattern forming method
TOKYO ELECTRON LTD0 citations52
US12197129B2Jan 14, 2025
Substrate treatment method and substrate treatment system
TOKYO ELECTRON LTD0 citations50
US10741444B2Aug 11, 2020
Method of forming film
TOKYO ELECTRON LTD0 citations42
US10539876B2Jan 21, 2020
Pattern forming method
TOKYO ELECTRON LTD0 citations42
US10074557B2Sep 11, 2018
Pattern forming method
TOKYO ELECTRON LTD0 citations42
US9818612B2Nov 14, 2017
Method for manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations42
US9679770B2Jun 13, 2017
Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
TOKYO ELECTRON LTD0 citations42
US9653293B2May 16, 2017
Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
TOKYO ELECTRON LTD0 citations42
US10317797B2Jun 11, 2019
Pattern forming method for forming a pattern
TOKYO ELECTRON LTD0 citations41
YAEGASHI HIDETAMI
4 patentsUS8551691B2Oct 8, 2013
Method of forming mask pattern
YAEGASHI HIDETAMI3 citations61
US8283253B2Oct 9, 2012
Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus
YAEGASHI HIDETAMI4 citations61
US8273661B2Sep 25, 2012
Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus
YAEGASHI HIDETAMI3 citations61
US8263320B2Sep 11, 2012
Method, program and system for processing substrate
YAEGASHI HIDETAMI0 citations51