Inventor
NISHIZUKA TETSUYA
JP15 patents
⚠️ This page may combine multiple inventors who share the name “NISHIZUKA TETSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
8 patentsUS7396431B2Jul 8, 2008
Plasma processing system for treating a substrate
TOKYO ELECTRON LTD50 citations89
US7268084B2Sep 11, 2007
Method for treating a substrate
TOKYO ELECTRON LTD8 citations69
US9048182B2Jun 2, 2015
Semiconductor device manufacturing method
TOKYO ELECTRON LTD1 citations62
US12456628B2Oct 28, 2025
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US8343308B2Jan 1, 2013
Ceiling plate and plasma process apparatus
TOKYO ELECTRON LTD4 citations61
US7842617B2Nov 30, 2010
Etching method and etching apparatus
TOKYO ELECTRON LTD3 citations61
US9362135B2Jun 7, 2016
Semiconductor device manufacturing method
TOKYO ELECTRON LTD0 citations51
US8980048B2Mar 17, 2015
Plasma etching apparatus
TOKYO ELECTRON LTD1 citations51
NISHIZUKA TETSUYA
4 patentsUS8809199B2Aug 19, 2014
Method of etching features in silicon nitride films
NISHIZUKA TETSUYA44 citations91
US8753527B2Jun 17, 2014
Plasma etching method and plasma etching apparatus
NISHIZUKA TETSUYA3 citations60
US8765589B2Jul 1, 2014
Semiconductor device manufacturing method
NISHIZUKA TETSUYA0 citations50
US8298955B2Oct 30, 2012
Plasma etching method
NISHIZUKA TETSUYA0 citations39