Inventor
MOON SEUNG CHAN
KR20 patents
⚠️ This page may combine multiple inventors who share the name “MOON SEUNG CHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HYNIX SEMICONDUCTOR INC
15 patentsUS7238653B2Jul 3, 2007
Cleaning solution for photoresist and method for forming pattern using the same
HYNIX SEMICONDUCTOR INC464 citations98
US6916594B2Jul 12, 2005
Overcoating composition for photoresist and method for forming photoresist pattern using the same
HYNIX SEMICONDUCTOR INC128 citations98
US7442648B2Oct 28, 2008
Method for fabricating semiconductor device using tungsten as sacrificial hard mask
HYNIX SEMICONDUCTOR INC9 citations83
US7303858B2Dec 4, 2007
Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device
HYNIX SEMICONDUCTOR INC9 citations73
US7615338B2Nov 10, 2009
Photoresist coating composition and method for forming fine pattern using the same
HYNIX SEMICONDUCTOR INC2 citations63
US7534548B2May 19, 2009
Polymer for immersion lithography and photoresist composition
HYNIX SEMICONDUCTOR INC2 citations62
US7462439B2Dec 9, 2008
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
HYNIX SEMICONDUCTOR INC3 citations62
US7381519B2Jun 3, 2008
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
HYNIX SEMICONDUCTOR INC4 citations62
US7288364B2Oct 30, 2007
Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same
HYNIX SEMICONDUCTOR INC3 citations62
US7494935B2Feb 24, 2009
Method for forming fine pattern of semiconductor device
HYNIX SEMICONDUCTOR INC4 citations58
US7838201B2Nov 23, 2010
Method for manufacturing a semiconductor device
HYNIX SEMICONDUCTOR INC0 citations52
US7494599B2Feb 24, 2009
Method for fabricating fine pattern in semiconductor device
HYNIX SEMICONDUCTOR INC1 citations52
US7205089B2Apr 17, 2007
Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same
HYNIX SEMICONDUCTOR INC1 citations52
US7198887B2Apr 3, 2007
Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the same
HYNIX SEMICONDUCTOR INC0 citations49
US7419760B2Sep 2, 2008
Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern
HYNIX SEMICONDUCTOR INC0 citations41
HYUNDAI ELECTRONICS IND
4 patentsUS5741625AApr 21, 1998
Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material
HYUNDAI ELECTRONICS IND32 citations92
US5716758AFeb 10, 1998
Process for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masks
HYUNDAI ELECTRONICS IND36 citations92
US5705319AJan 6, 1998
Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers
HYUNDAI ELECTRONICS IND7 citations73
US5650250AJul 22, 1997
Light exposure mask for semiconductor devices
HYUNDAI ELECTRONICS IND8 citations73