Inventor
IVANOV VLADIMIR VITALEVITCH
RU24 patents
⚠️ This page may combine multiple inventors who share the name “IVANOV VLADIMIR VITALEVITCH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
22 patentsUS7462850B2Dec 9, 2008
Radical cleaning arrangement for a lithographic apparatus
ASML NETHERLANDS BV60 citations98
US7251012B2Jul 31, 2007
Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris
ASML NETHERLANDS BV25 citations91
US7812330B2Oct 12, 2010
Radical cleaning arrangement for a lithographic apparatus
ASML NETHERLANDS BV8 citations84
US7061574B2Jun 13, 2006
Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV11 citations84
US7504643B2Mar 17, 2009
Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
ASML NETHERLANDS BV10 citations83
US7495239B2Feb 24, 2009
Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
ASML NETHERLANDS BV8 citations83
US7501642B2Mar 10, 2009
Radiation source
ASML NETHERLANDS BV7 citations73
US7135692B2Nov 14, 2006
Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
ASML NETHERLANDS BV8 citations73
US7372058B2May 13, 2008
Ex-situ removal of deposition on an optical element
ASML NETHERLANDS BV8 citations70
US7208746B2Apr 24, 2007
Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV9 citations68
US7838853B2Nov 23, 2010
Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method
ASML NETHERLANDS BV2 citations62
US7684012B2Mar 23, 2010
Lithographic device, device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV2 citations62
US7557366B2Jul 7, 2009
Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV2 citations62
US7518134B2Apr 14, 2009
Plasma radiation source for a lithographic apparatus
ASML NETHERLANDS BV6 citations62
US7696493B2Apr 13, 2010
Radiation system and lithographic apparatus
ASML NETHERLANDS BV5 citations61
US7696492B2Apr 13, 2010
Radiation system and lithographic apparatus
ASML NETHERLANDS BV6 citations61
US7462851B2Dec 9, 2008
Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV5 citations61
US8018574B2Sep 13, 2011
Lithographic apparatus, radiation system and device manufacturing method
ASML NETHERLANDS BV2 citations60
US7767989B2Aug 3, 2010
Ex-situ removal of deposition on an optical element
ASML NETHERLANDS BV1 citations60
US7279690B2Oct 9, 2007
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV2 citations60
US8362444B2Jan 29, 2013
Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method
ASML NETHERLANDS BV1 citations51
US7335900B2Feb 26, 2008
Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV0 citations49