Inventor

SHIBAYAMA WATARU

JP34 patents

⚠️ This page may combine multiple inventors who share the name “SHIBAYAMA WATARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIBAYAMA WATARU

NISSAN CHEMICAL IND LTD

Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group

Silicon-containing resists underlayer film-forming composition having phenyl group-containing chromophore

Coating composition for pattern reversal on soc pattern

Resist underlayer film forming composition containing silicon having anion group

Silicon-containing EUV resist underlayer film-forming composition including additive

Radiation sensitive composition

Silicon-containing resist underlayer film-forming composition having phenyl group-containing chromophore

Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate

Composition for coating resist pattern

Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group

Composition for forming silicon-containing resist underlayer film removable by wet process

Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure

Metal-containing resist underlayer film-forming composition containing polyacid

Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton

NISSAN CHEMICAL CORP

Method for producing resist pattern coating composition with use of solvent replacement method

Silicon-containing resist underlayer film-forming composition including organic group having ammonium group

Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group

Alkaline developer soluable silicon-containing resist underlayer film-forming composition

Coating composition for pattern inversion

Film-forming composition

Composition for forming resist underlying film

Composition for resist pattern metallization process

Film-forming composition

Isocyanuric acid derivative having alkoxyalkyl groups and method for producing the same

NAKAJIMA MAKOTO

Resist underlayer film forming composition containing silicon having nitrogen-containing ring

Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group

Silicon-containing resist underlayer film forming composition having urea group

Resist underlayer film forming composition containing silicone having cyclic amino group

SHIBAYAMA WATARU

Resist underlayer film forming composition containing silicon having anion group

Resist underlayer film forming composition containing silicone having onium group

KANNO YUTA

Silicon-containing composition having sulfonamide group for forming resist underlayer film

Resist underlayer film forming composition containing silicon having sulfide bond

SAMSUNG ELECTRONICS CO LTD

Substrate treating composition and method for fabricating a semiconductor device using the same

Substrate treating composition and method for fabricating a semiconductor device using the same