Inventor
NAMGUNG RAN
KR22 patents
⚠️ This page may combine multiple inventors who share the name “NAMGUNG RAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG SDI CO LTD
19 patentsUS11609494B2Mar 21, 2023
Semiconductor photoresist composition and method of forming patterns using the composition
SAMSUNG SDI CO LTD5 citations73
US11092890B2Aug 17, 2021
Semiconductor resist composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD2 citations71
US10066057B2Sep 4, 2018
Organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD2 citations70
US10340148B2Jul 2, 2019
Polymer, organic layer composition, and method of forming patterns
SAMSUNG SDI CO LTD2 citations69
US9873815B2Jan 23, 2018
Polymer, organic layer composition, and method of forming patterns
SAMSUNG SDI CO LTD2 citations68
US11789362B2Oct 17, 2023
Semiconductor resist composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations60
US11789361B2Oct 17, 2023
Semiconductor resist composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations60
US11092889B2Aug 17, 2021
Semiconductor resist composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD1 citations60
US11073761B2Jul 27, 2021
Semiconductor resist composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations60
US12158699B2Dec 3, 2024
Semiconductor photoresist composition and method of forming patterns using the composition
SAMSUNG SDI CO LTD1 citations59
US12554199B2Feb 17, 2026
Resist topcoat composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations49
US12306534B2May 20, 2025
Semiconductor photoresist composition and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations49
US11415885B2Aug 16, 2022
Semiconductor photoresist composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations49
US12590221B2Mar 31, 2026
Resist topcoat composition, and method of forming patterns using the composition
SAMSUNG SDI CO LTD0 citations48
US9758612B2Sep 12, 2017
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD1 citations48
US9593205B2Mar 14, 2017
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD1 citations48
US10323124B2Jun 18, 2019
Polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations38
US9862668B2Jan 9, 2018
Monomer, polymer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations38
US10364221B2Jul 30, 2019
Monomer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations33