P

Inventor

HAMADA YUICHI

JP65 patents
⚠️ This page may combine multiple inventors who share the name “HAMADA YUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

22 patents
US5723860AMar 3, 1998

Frame-supported pellicle for photomask protection

SHINETSU CHEMICAL CO53 citations96
US6436586B1Aug 20, 2002

Pellicle with a filter and method for production thereof

SHINETSU CHEMICAL CO48 citations93
US5378514AJan 3, 1995

Frame-supported pellicle for photolithography

SHINETSU CHEMICAL CO36 citations93
US5693382ADec 2, 1997

Frame-supported pellicle for dustproof protection of photomask in photolithography

SHINETSU CHEMICAL CO36 citations92
US5691088ANov 25, 1997

Pellicle for protection of photolithographic mask

SHINETSU CHEMICAL CO26 citations92
US5616927AApr 1, 1997

Frame-supported pellicle for dustproof protection of photomask

SHINETSU CHEMICAL CO30 citations92
US5470621ANov 28, 1995

Frame-supported pellicle for dustproof protection of photomask

SHINETSU CHEMICAL CO34 citations91
US8026023B2Sep 27, 2011

Lithographic pellicle

SHINETSU CHEMICAL CO11 citations84
US5300348AApr 5, 1994

Frame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesive

SHINETSU CHEMICAL CO20 citations84
US5597669AJan 28, 1997

Frame-supported pellicle for photolithography

SHINETSU CHEMICAL CO14 citations74
US5370951ADec 6, 1994

Frame-supported pellicle for protection of photolithographic mask

SHINETSU CHEMICAL CO16 citations74
US5327808AJul 12, 1994

Method for the preparation of a frame-supported pellicle for photolithography

SHINETSU CHEMICAL CO14 citations74
US11474427B2Oct 18, 2022

Pellicle frame, pellicle, and method of producing pellicle frame

SHINETSU CHEMICAL CO1 citations73
US11003070B2May 11, 2021

Pellicle frame, pellicle, and method of producing pellicle frame

SHINETSU CHEMICAL CO2 citations73
US5419972AMay 30, 1995

Frame-supported pellicle for dustproof protection of photomask

SHINETSU CHEMICAL CO15 citations72
US12265324B2Apr 1, 2025

Agglutinant for pellicle, pellicle, exposure original plate with pellicle, method for producing semiconductor device, method for producing liquid crystal display board, method for regenerating exposure original plate, and peeling residue reduction method

SHINETSU CHEMICAL CO1 citations64
US12130550B2Oct 29, 2024

Pellicle frame, pellicle, and method of producing pellicle frame

SHINETSU CHEMICAL CO0 citations63
US5965294AOct 12, 1999

Hydrogen absorbing alloy electrode

SHINETSU CHEMICAL CO6 citations63
US5368675ANov 29, 1994

Method for the preparation of a frame-supported pellicle for photolithography

SHINETSU CHEMICAL CO6 citations63
US10962877B2Mar 30, 2021

Method of separating pellicle and device for separating pellicle

SHINETSU CHEMICAL CO0 citations52
US10712658B2Jul 14, 2020

Method of procuring an agglutinant structure and a method of manufacturing a pellicle including said agglutinant procuring method

SHINETSU CHEMICAL CO0 citations52
US10338465B2Jul 2, 2019

Pellicle frame and pellicle

SHINETSU CHEMICAL CO0 citations52

SYSMEX CORP

12 patents

HAMADA YUICHI

10 patents

NAGAI TAKAAKI

3 patents

ISUZU MOTORS LTD

1 patent

MAHLE FILTER SYSTEMS JP CORP

1 patent

NICHIA CORP

1 patent

Showing the top 50 of 65 patents by PatentIndex Score.