Inventor
CHEN NORMAN
TW22 patents
⚠️ This page may combine multiple inventors who share the name “CHEN NORMAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
GLOBALFOUNDRIES INC
10 patentsUS9026977B2May 5, 2015
Power rail layout for dense standard cell library
GLOBALFOUNDRIES INC15 citations83
US10386715B2Aug 20, 2019
Methodology for post-integration awareness in optical proximity correction
GLOBALFOUNDRIES INC4 citations70
US8612904B1Dec 17, 2013
Use of polarization and composite illumination source for advanced optical lithography
GLOBALFOUNDRIES INC5 citations65
US9443055B2Sep 13, 2016
Methods for retargeting circuit design layouts and for fabricating semiconductor devices using retargeted layouts
GLOBALFOUNDRIES INC1 citations49
US9064086B2Jun 23, 2015
Retargeting semiconductor device shapes for multiple patterning processes
GLOBALFOUNDRIES INC0 citations49
US8910094B2Dec 9, 2014
Retargeting semiconductor device shapes for multiple patterning processes
GLOBALFOUNDRIES INC1 citations49
US9484300B2Nov 1, 2016
Device resulting from printing minimum width semiconductor features at non-minimum pitch
GLOBALFOUNDRIES INC0 citations48
US9263349B2Feb 16, 2016
Printing minimum width semiconductor features at non-minimum pitch and resulting device
GLOBALFOUNDRIES INC0 citations48
US9171735B2Oct 27, 2015
Method for fabricating a semiconductor integrated circuit with a litho-etch, litho-etch process for etching trenches
GLOBALFOUNDRIES INC1 citations47
US10401837B2Sep 3, 2019
Generating risk inventory and common process window for adjustment of manufacturing tool
GLOBALFOUNDRIES INC0 citations38
TAIWAN SEMICONDUCTOR MFG CO LTD
5 patentsUS10459352B2Oct 29, 2019
Mask cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US11921434B2Mar 5, 2024
Mask cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11740563B2Aug 29, 2023
Mask cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11256179B2Feb 22, 2022
Mask cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US9886543B2Feb 6, 2018
Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations42
TAIWAN SEMICONDUCTOR MFG
4 patentsUS7838205B2Nov 23, 2010
Utilization of electric field with isotropic development in photolithography
TAIWAN SEMICONDUCTOR MFG2 citations63
US7642101B2Jan 5, 2010
Semiconductor device having in-chip critical dimension and focus patterns
TAIWAN SEMICONDUCTOR MFG4 citations62
US7387969B2Jun 17, 2008
Top patterned hardmask and method for patterning
TAIWAN SEMICONDUCTOR MFG2 citations62
US9366969B2Jun 14, 2016
Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG0 citations41