Inventor
CHANG VENCENT
TW17 patents
⚠️ This page may combine multiple inventors who share the name “CHANG VENCENT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
7 patentsUS7767570B2Aug 3, 2010
Dummy vias for damascene process
TAIWAN SEMICONDUCTOR MFG15 citations91
US7960821B2Jun 14, 2011
Dummy vias for damascene process
TAIWAN SEMICONDUCTOR MFG6 citations72
US7648918B2Jan 19, 2010
Method of pattern formation in semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG4 citations63
US7642101B2Jan 5, 2010
Semiconductor device having in-chip critical dimension and focus patterns
TAIWAN SEMICONDUCTOR MFG4 citations62
US7387969B2Jun 17, 2008
Top patterned hardmask and method for patterning
TAIWAN SEMICONDUCTOR MFG2 citations62
US8815496B2Aug 26, 2014
Method for patterning a photosensitive layer
TAIWAN SEMICONDUCTOR MFG0 citations51
US9366969B2Jun 14, 2016
Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG0 citations41
UNITED MICROELECTRONICS CORP
4 patentsUS7432042B2Oct 7, 2008
Immersion lithography process and mask layer structure applied in the same
UNITED MICROELECTRONICS CORP34 citations92
US6458705B1Oct 1, 2002
Method for forming via-first dual damascene interconnect structure
UNITED MICROELECTRONICS CORP44 citations92
US6680252B2Jan 20, 2004
Method for planarizing barc layer in dual damascene process
UNITED MICROELECTRONICS CORP25 citations88
US6844143B2Jan 18, 2005
Sandwich photoresist structure in photolithographic process
UNITED MICROELECTRONICS CORP8 citations74
LIU GEORGE
4 patentsUS8119533B2Feb 21, 2012
Pattern formation in semiconductor fabrication
LIU GEORGE3 citations62
US8623231B2Jan 7, 2014
Method for etching an ultra thin film
LIU GEORGE0 citations51
US8472005B2Jun 25, 2013
Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication
LIU GEORGE0 citations51
US9091923B2Jul 28, 2015
Contrast enhancing exposure system and method for use in semiconductor fabrication
LIU GEORGE0 citations41