Inventor
LIN PING-HSUN
TW25 patents
Patents
25 patentsUS10295899B2May 21, 2019
Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US12181797B2Dec 31, 2024
Extreme ultraviolet mask with alloy based absorbers
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11860532B2Jan 2, 2024
Photomask including fiducial mark and method of making a semiconductor device using the photomask
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11422466B2Aug 23, 2022
Photomask including fiducial mark and method of making semiconductor device using the photomask
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11042084B2Jun 22, 2021
Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11435660B2Sep 6, 2022
Photomask and method of fabricating a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12578270B2Mar 17, 2026
Mask characterization methods
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12517423B2Jan 6, 2026
Extreme ultraviolet mask with alloy based absorbers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12346020B2Jul 1, 2025
Optical assembly with coating and methods of use
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12346023B2Jul 1, 2025
Optical assembly with coating and methods of use
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12339582B2Jun 24, 2025
Photomask including fiducial mark and method of making a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12265322B2Apr 1, 2025
EUV mask blank and method of making EUV mask blank
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12001132B2Jun 4, 2024
Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11982936B2May 14, 2024
Photomask and method of fabricating a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11815804B2Nov 14, 2023
EUV mask blank and method of making EUV mask blank
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11287754B2Mar 29, 2022
Mask blank for lithography and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11119398B2Sep 14, 2021
EUV photo masks
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10871721B2Dec 22, 2020
Mask blank for lithography and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12400864B2Aug 26, 2025
Methods and systems for improving plasma ignition stability
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12366797B2Jul 22, 2025
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12044959B2Jul 23, 2024
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11592737B2Feb 28, 2023
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12523929B2Jan 13, 2026
Methods for removing catalyst particles from nanotube films
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12353120B2Jul 8, 2025
EUV photo masks and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12578652B2Mar 17, 2026
Photomask and methods for measuring and manufacturing the photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48