Inventor

TOUKHY MEDHAT A

US38 patents

⚠️ This page may combine multiple inventors who share the name “TOUKHY MEDHAT A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOUKHY MEDHAT A

OCG MICROELECTRONIC MATERIALS

Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions

O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images

Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions

High ortho-ortho bonded novolak binder resins and their use in a process for forming positive resist patterns

High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions

O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles

Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures

Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions

High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions

Positive image formation utilizing radiation sensitive mixture containing dimeric or trimeric sesamol/aldehyde condensation products as sensitivity enhancers

Process of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanone

Phenolic novolak resin compositions containing 5-indanol and their use in radiation-sensitive compositions

Phenolic novolak resin compositions containing 5-indanol and their use a process for forming positive resist patterns

Radiation-sensitive compositions containing 5-indanol in the binder resin as a comonomer

Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions and processes of forming resist images

Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions

Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures

Selected trihydroxybenzophenone compounds

Selected trihydroxybenzophenone compounds and their use as photoactive compounds

OLIN HUNT SPECIALTY PROD

Light sensitive composition with o-quinone diazide and phenolic novolak resin made using methylol substituted trihydroxybenzophenone as reactant

Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures

Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group

Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group

Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures

HUNT CHEM CORP PHILIP A

Positive photoresist composition with cresol-formaldehyde novolak resins

Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide

Positive novolak photoresist compositions

MERCK PATENT GMBH

DNQ-type photoresist composition including alkali-soluble acrylic resins

Novolak/DNQ based, chemically amplified photoresist

Negative resist formulation for producing undercut pattern profiles

OLIN MICROELECTRONIC CHEM INC

Selected high thermal novolaks and positive-working radiation-sensitive compositions

Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures

AZ ELECTRONIC MATERIALS USA

Photoresist composition for imaging thick films

Process for producing an image using a first minimum bottom antireflective coating composition

CLARIANT FINANCE BVI LTD

Positive-working photoimageable bottom antireflective coating

ARCH SPEC CHEM INC

Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures

TOUKHY MEDHAT A

Thick film resists

RIDGEFIELD ACQUISITION

Enviromentally stable, thick film, chemically amplified resist