Inventor

JEFFRIES III ALFRED T

US26 patents

⚠️ This page may combine multiple inventors who share the name “JEFFRIES III ALFRED T”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JEFFRIES III ALFRED T

OCG MICROELECTRONIC MATERIALS

Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde

Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixtures

Coated substrate utilizing composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone as sensitivity enhancers

O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles

Selected block phenolic oligomers and their use in radiation-sensitive resist compositions

Positive image formation utilizing o-quinonediazide composition including selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone

Process of developing a positive image utilizing o-naphthoquinone diazide radiation-sensitive esters of phenolic derivatives of 4-(4-hydroxyphenyl)cyclohexanone

Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions

Process of developing an image-wise exposed resist-coated substrate

Selected block copolymer novolak binder resins

Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions

Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image

Selected trihydroxybenzophenone compounds

Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures

Selected trihydroxybenzophenone compounds and their use as photoactive compounds

Selected block copolymer novolak binder resins in radiation-sensitive resist compositions

OLIN HUNT SPECIALTY PROD

Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin

Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group

Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures

Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group

Thermally stable phenolic resin compositions with ortho, ortho methylene linkage

Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures

Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures

HUNT CHEM CORP PHILIP A

Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes

ARCH SPEC CHEM INC

Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures

OLIN MICROELECTRONIC CHEM INC

Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures