Inventor

CHAN KELVIN

US99 patents

⚠️ This page may combine multiple inventors who share the name “CHAN KELVIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHAN KELVIN

APPLIED MATERIALS INC

Method to reduce gas-phase reactions in a PECVD process with silicon and organic precursors to deposit defect-free initial layers

Methods for wordline separation in 3D-NAND devices

Methods for wordline separation in 3D-NAND devices

CVD based oxide-metal multi structure for 3D NAND memory devices

Methods for wordline separation in 3D-NAND devices

Low-k dielectric damage repair by vapor-phase chemical exposure

Cobalt selectivity improvement in selective cobalt process sequence

Method of improving initiation layer for low-k dielectric film by digital liquid flow meter

Selectively lateral growth of silicon oxide thin film

Methods for depositing tungsten on halosilane based metal silicide nucleation layers

Conformal amorphous silicon as nucleation layer for W ALD process

UV-assisted photochemical vapor deposition for damaged low K films pore sealing

Method to reduce dielectric constant of a porous low-k film

Selectively lateral growth of silicon oxide thin film

Methods and apparatus for processing a substrate

Techniques and device structures based upon directional dielectric deposition and bottom-up fill

Enhancement of modulus and hardness for UV-cured ultra low-k dielectric films

Method and hardware for cleaning UV chambers

Method and hardware for cleaning UV chambers

Techniques for void-free material depositions

Methods of forming nucleation layers with halogenated silanes

Method of improving initiation layer for low-k dielectric film by digital liquid flow meter

Nucleation-free gap fill ALD process

Plasma enhanced CVD with periodic high voltage bias

Enhanced spatial ALD of metals through controlled precursor mixing

CVD based oxide-metal multi structure for 3D NAND memory devices

Selective oxidation and simplified pre-clean

Doped and undoped vanadium oxides for low-k spacer applications

Nucleation-free gap fill ALD process

Methods of forming self-aligned vias

Doped and undoped vanadium oxides for low-k spacer applications

Enhanced spatial ALD of metals through controlled precursor mixing

Cobalt selectivity improvement in selective cobalt process sequence

Capacitive sensor for monitoring gas concentration

CISCO TECH INC

Measuring latency within a networking device

Deterministic calibrated synchronized network interlink access

Congestion notification reporting for a responsive network

Measuring latency within a networking device

System and method to measure and score application health via correctable errors

System and method to measure and score application health via correctable errors

System and method to measure and score application health via correctable errors

CHAN KELVIN

Compact portable air cooler

Low-k dielectric damage repair by vapor-phase chemical exposure

Managing a sharing of media content among client computers

Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer

GOOGLE LLC

Managing a sharing of media content among client computers

Managing a sharing of media content amount client computers

XIE BO

UV assisted silylation for recovery and pore sealing of damaged low K films

MASSACHUSETTS INST TECHNOLOGY

Chemical vapor deposition of hydrogel films

DING YIYANG JOY

Methods for identifying related documents