Inventor

ROCHA-ALVAREZ JUAN CARLOS

US158 patents

⚠️ This page may combine multiple inventors who share the name “ROCHA-ALVAREZ JUAN CARLOS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ROCHA-ALVAREZ JUAN CARLOS

APPLIED MATERIALS INC

Ceramic heater and esc with enhanced wafer edge performance

Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors

Method and apparatus for cleaning a CVD chamber

Heated gas distribution plate for a processing chamber

Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power

Remote plasma source for controlling plasma skew

PECVD process

Method and apparatus for fluid flow control

Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors

Tunable ground planes in plasma chambers

Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors

PECVD process

PECVD process

Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections

Methods of uniformity control for low flow process and chamber to chamber matching

Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation

High efficiency UV curing system

Uniformity control for low flow process and chamber to chamber matching

Blocker plate bypass to distribute gases in a chemical vapor deposition system

Method for curing low dielectric constant film using direct current bias

Apparatus for radical-based deposition of dielectric films

Isolator apparatus and methods for substrate processing chambers

PECVD process

Semiconductor process equipment

External substrate rotation in a semiconductor processing system

Processing system containing an isolation region separating a deposition chamber from a treatment chamber

PECVD process

Multi-zone pedestal for plasma processing

Method for UV based silylation chamber clean

Method of improving initiation layer for low-k dielectric film by digital liquid flow meter

Purge heater design and process development for the improvement of low k film properties

Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system

Auto frequency tuned remote plasma source

Interface engineering to improve adhesion between low k stacks

Enhancement in UV curing efficiency using oxygen-doped purge for ultra low-K dielectric film

Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile

On-board metrology (OBM) design and implication in process tool

PECVD process

Plasma corrision resistive heater for high temperature processing

Showerhead assembly with multiple fluid delivery zones

Apparatus and method for UV treatment, chemical treatment, and deposition

Plasma corrosion resistive heater for high temperature processing

Showerhead assembly with multiple fluid delivery zones

Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates

BALUJA SANJEEV

Quartz showerhead for nanocure UV chamber

Method and apparatus for modulating wafer treatment profile in UV chamber

KASZUBA ANDRZEI

Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors

ROCHA-ALVAREZ JUAN CARLOS

Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation

YAP LIPYEOW

Multifunctional heater/chiller pedestal for wide range wafer temperature control

REILLY PATRICK

Deposition of an amorphous carbon layer with high film density and high etch selectivity