Inventor
LOGAN JOSEPH S
US21 patents
⚠️ This page may combine multiple inventors who share the name “LOGAN JOSEPH S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
19 patentsUS5191506AMar 2, 1993
Ceramic electrostatic chuck
IBM144 citations98
US5155652AOct 13, 1992
Temperature cycling ceramic electrostatic chuck
IBM144 citations97
US5055964AOct 8, 1991
Electrostatic chuck having tapered electrodes
IBM120 citations97
US5561585AOct 1, 1996
Electrostatic chuck with reference electrode
IBM74 citations96
US5463525AOct 31, 1995
Guard ring electrostatic chuck
IBM101 citations96
US5302266AApr 12, 1994
Method and apparatus for filing high aspect patterns with metal
IBM119 citations95
US4367119AJan 4, 1983
Planar multi-level metal process with built-in etch stop
IBM78 citations95
US5263776ANov 23, 1993
Multi-wavelength optical thermometry
IBM40 citations93
US3994793ANov 30, 1976
Reactive ion etching of aluminum
IBM86 citations93
US5535507AJul 16, 1996
Method of making electrostatic chuck with oxide insulator
IBM47 citations92
US5467249ANov 14, 1995
Electrostatic chuck with reference electrode
IBM28 citations92
US5208512AMay 4, 1993
Scanned electron cyclotron resonance plasma source
IBM34 citations92
US5099571AMar 31, 1992
Method for fabricating a split-ring electrostatic chuck
IBM44 citations92
US4818359AApr 4, 1989
Low contamination RF sputter deposition apparatus
IBM36 citations92
US4637853AJan 20, 1987
Hollow cathode enhanced plasma for high rate reactive ion etching and deposition
IBM55 citations92
US4447824AMay 8, 1984
Planar multi-level metal process with built-in etch stop
IBM36 citations92
US4362611ADec 7, 1982
Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
IBM29 citations88
US5612851AMar 18, 1997
Guard ring electrostatic chuck
IBM15 citations82
US4333794AJun 8, 1982
Omission of thick Si3 N4 layers in ISA schemes
IBM20 citations74