Inventor
ICHINOSE HIDEO
DE28 patents
⚠️ This page may combine multiple inventors who share the name “ICHINOSE HIDEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MERCK PATENT GMBH
17 patentsUS6066268AMay 23, 2000
Liquid-crystalline medium
MERCK PATENT GMBH76 citations94
US6764723B2Jul 20, 2004
Liquid-crystalline medium
MERCK PATENT GMBH31 citations92
US5714087AFeb 3, 1998
Supertwist liquid-crystal display
MERCK PATENT GMBH34 citations91
US7351453B2Apr 1, 2008
Liquid crystal medium
MERCK PATENT GMBH18 citations84
US6790488B1Sep 14, 2004
Liquid-crystalline medium
MERCK PATENT GMBH16 citations83
US6248410B1Jun 19, 2001
Electro-optical liquid-crystal display
MERCK PATENT GMBH18 citations82
US6793985B2Sep 21, 2004
Liquid crystalline medium and liquid crystal display
MERCK PATENT GMBH9 citations73
US6524666B1Feb 25, 2003
Nematic liquid crystal composition for active matrix application and reflective liquid crystal displays
MERCK PATENT GMBH7 citations73
US5753142AMay 19, 1998
Nematic liquid-crystal composition for active matrix application
MERCK PATENT GMBH8 citations73
US7582338B2Sep 1, 2009
Liquid crystal medium
MERCK PATENT GMBH2 citations63
US6695979B2Feb 24, 2004
Liquid crystalline medium and liquid crystal display
MERCK PATENT GMBH2 citations63
US6692796B2Feb 17, 2004
Liquid crystalline medium and liquid crystal display
MERCK PATENT GMBH5 citations63
US6673268B1Jan 6, 2004
Liquid-crystalline medium
MERCK PATENT GMBH2 citations63
US7553523B2Jun 30, 2009
Liquid crystal medium
MERCK PATENT GMBH2 citations62
US6602562B2Aug 5, 2003
Electro-optical liquid-crystal display
MERCK PATENT GMBH4 citations62
US6506462B1Jan 14, 2003
Liquid crystalline medium
MERCK PATENT GMBH5 citations61
US5827450AOct 27, 1998
Benzene derivatives, and liquid-crystalline medium
MERCK PATENT GMBH4 citations61
TOSHIBA KK
3 patentsUS6607986B2Aug 19, 2003
Dry etching method and semiconductor device manufacturing method
TOSHIBA KK18 citations92
US6846750B1Jan 25, 2005
High precision pattern forming method of manufacturing a semiconductor device
TOSHIBA KK9 citations73
US6987066B2Jan 17, 2006
Dry etching method and semiconductor device manufacturing method
TOSHIBA KK3 citations62