P

Inventor

LIBERA GIOVANNA DALLA

IT16 patents

Patents

16 patents
US6351008B1Feb 26, 2002

Method for manufacturing electronic devices having non-volatile memory cells and LV transistors with salicided junctions

ST MICROELECTRONICS SRL17 citations92
US6350652B1Feb 26, 2002

Process for manufacturing nonvolatile memory cells with dimensional control of the floating gate regions

ST MICROELECTRONICS SRL55 citations92
US6281077B1Aug 28, 2001

Method for manufacturing electronic devices comprising non-volatile memory cells and LV transistors with salicided junctions

ST MICROELECTRONICS SRL27 citations92
US6251728B1Jun 26, 2001

Method for manufacturing electronic devices having HV transistors and LV transistors with salicided junctions

ST MICROELECTRONICS SRL17 citations92
US6221717B1Apr 24, 2001

EEPROM memory cell comprising a selection transistor with threshold voltage adjusted by implantation, and related manufacturing process

ST MICROELECTRONICS SRL31 citations92
US6420769B2Jul 16, 2002

Method for manufacturing electronic devices having HV transistors and LV transistors with salicided junctions

ST MICROELECTRONICS SRL13 citations73
US6380034B1Apr 30, 2002

Process for manufacturing memory cells with dimensional control of the floating gate regions

ST MICROELECTRONICS SRL8 citations73
US6274411B1Aug 14, 2001

Method for manufacturing electronic devices, comprising non-salicided non-volatile memory cells, non-salicided HV transistors, and LV transistors with salicided junctions with few masks

ST MICROELECTRONICS SRL14 citations73
US6414349B1Jul 2, 2002

High efficiency memory device

ST MICROELECTRONICS SRL2 citations62
US6396101B2May 28, 2002

Method for manufacturing electronic devices comprising non-volatile memory cells and LV transistors with salicided junctions

ST MICROELECTRONICS SRL2 citations62
US6340828B1Jan 22, 2002

Process for manufacturing nonvolatile memory cells with dimensional control of the floating gate regions

ST MICROELECTRONICS SRL2 citations62
US6329254B1Dec 11, 2001

Memory cell of the EEPROM type having its threshold adjusted by implantation, and fabrication method

ST MICROELECTRONICS SRL6 citations62
US6548354B2Apr 15, 2003

Process for producing a semiconductor memory device comprising mass-storage memory cells and shielded memory cells for storing reserved information

ST MICROELECTRONICS SRL1 citations51
US6437395B2Aug 20, 2002

Process for the manufacturing of an electrically programmable non-volatile memory device

ST MICROELECTRONICS SRL1 citations51
US6240011B1May 29, 2001

Eeprom cell with improved current performance

ST MICROELECTRONICS SRL1 citations51
US6642582B1Nov 4, 2003

Circuit structure with a parasitic transistor having high threshold voltage

ST MICROELECTRONICS SRL0 citations41