Inventor
YEDAVE SHARAD N
US23 patents
⚠️ This page may combine multiple inventors who share the name “YEDAVE SHARAD N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ENTEGRIS INC
16 patentsUS11299802B2Apr 12, 2022
Germanium tetraflouride and hydrogen mixtures for an ion implantation system
ENTEGRIS INC6 citations85
US10109488B2Oct 23, 2018
Phosphorus or arsenic ion implantation utilizing enhanced source techniques
ENTEGRIS INC3 citations73
US11139145B2Oct 5, 2021
Ion implantation system with mixture of arc chamber materials
ENTEGRIS INC2 citations72
US9960042B2May 1, 2018
Carbon dopant gas and co-flow for implant beam and source life performance improvement
ENTEGRIS INC4 citations71
US11827973B2Nov 28, 2023
Germanium tetraflouride and hydrogen mixtures for an ion implantation system
ENTEGRIS INC0 citations62
US11682540B2Jun 20, 2023
Ion implantation system with mixture of arc chamber materials
ENTEGRIS INC0 citations62
US11621148B2Apr 4, 2023
Plasma immersion methods for ion implantation
ENTEGRIS INC0 citations62
US11538687B2Dec 27, 2022
Fluorine ion implantation system with non-tungsten materials and methods of using
ENTEGRIS INC0 citations62
US11315791B2Apr 26, 2022
Fluorine ion implantation method and system
ENTEGRIS INC0 citations62
US11062906B2Jul 13, 2021
Silicon implantation in substrates and provision of silicon precursor compositions therefor
ENTEGRIS INC0 citations62
US10892137B2Jan 12, 2021
Ion implantation processes and apparatus using gallium
ENTEGRIS INC0 citations62
US10622192B2Apr 14, 2020
Methods and assemblies using fluorine containing and inert gases for plasma flood gun operation
ENTEGRIS INC1 citations62
US9142387B2Sep 22, 2015
Isotopically-enriched boron-containing compounds, and methods of making and using same
ENTEGRIS INC3 citations62
US10920087B2Feb 16, 2021
Hydrogenated isotopically enriched boront trifluoride dopant source gas composition
ENTEGRIS INC1 citations58
US9685304B2Jun 20, 2017
Isotopically-enriched boron-containing compounds, and methods of making and using same
ENTEGRIS INC0 citations52
US10354877B2Jul 16, 2019
Carbon dopant gas and co-flow for implant beam and source life performance improvement
ENTEGRIS INC0 citations50
KAIM ROBERT
3 patentsUS8598022B2Dec 3, 2013
Isotopically-enriched boron-containing compounds, and methods of making and using same
KAIM ROBERT12 citations92
US8062965B2Nov 22, 2011
Isotopically-enriched boron-containing compounds, and methods of making and using same
KAIM ROBERT21 citations92
US8138071B2Mar 20, 2012
Isotopically-enriched boron-containing compounds, and methods of making and using same
KAIM ROBERT3 citations62