Inventor
DAUELSBERG MARTIN
DE11 patents
⚠️ This page may combine multiple inventors who share the name “DAUELSBERG MARTIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AIXTRON AG
5 patentsUS6849241B2Feb 1, 2005
Device and method for depositing one or more layers on a substrate
AIXTRON AG401 citations96
US7294207B2Nov 13, 2007
Gas-admission element for CVD processes, and device
AIXTRON AG32 citations91
US6972050B2Dec 6, 2005
Method for depositing in particular crystalline layers, and device for carrying out the method
AIXTRON AG17 citations81
US7625448B2Dec 1, 2009
Inlet system for an MOCVD reactor
AIXTRON AG18 citations80
US6932866B2Aug 23, 2005
Method for depositing in particular crystalline layers
AIXTRON AG1 citations51
AIXTRON SE
3 patentsUS10221482B2Mar 5, 2019
Gas distributor for a CVD reactor
AIXTRON SE1 citations51
US12577674B2Mar 17, 2026
Method for identifying substrates which are faulty or have been incorrectly inserted into a CVD reactor
AIXTRON SE0 citations50
US10472718B2Nov 12, 2019
Temperature-controlled gas supply line with dilution gas flows supplied at multiple locations
AIXTRON SE0 citations34