Inventor

KOHMURA KAZUO

JP38 patents

⚠️ This page may combine multiple inventors who share the name “KOHMURA KAZUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOHMURA KAZUO

MITSUI CHEMICALS INC

Pellicle and EUV exposure device comprising same

Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device

Pellicle membrane, pellicle, original plate for exposure, exposure apparatus, and method of producing semiconductor device

Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device

Pellicle, pellicle production method and exposure method using pellicle

Semiconductor device, method for manufacturing the same, and rinsing liquid

Method of modifying porous film, modified porous film and use of same

Coating liquid for forming porous silica

Pellicle demounting method and pellicle demounting preprocessing device

Pellicle demounting method, and pellicle demounting device

Substrate laminated body and method of manufacturing substrate laminated body

Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle

Sealing composition for semiconductor, semiconductor device and method of producing the same, and polymer and method of producing the same

Water-repellent porous silica, method for preparation thereof and use thereof

Pellicle, exposure master, exposure device and method for manufacturing semiconductor device

Adhesive member and production method for adhesive member

Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method

Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithography

Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device

Pellicle manufacturing method and method for manufacturing photomask with pellicle

Method for producing semiconductor device and intermediate for semiconductor device

Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle

Pellicle film, pellicle frame, pellicle, and method for producing same

Semiconductor substrate manufacturing method, semiconductor device, and method for manufacturing same

Pellicle, production method thereof, exposure method

Method for manufacturing composite body and composition

NIPPON LIGHT METAL CO

Support frame for pellicles

Pellicle frame and pellicle

OKU YOSHIAKI

Manufacturing method of semiconductor device and semiconductor device produced therewith

Manufacturing method of semiconductor device and semiconductor device produced therewith

ONO SHOKO

Composition for sealing semiconductor, semiconductor device, and process for producing semiconductor device

Semiconductor device production method and rinse

FUJII NOBUTOSHI

Precursor composition for porous thin film, method for preparation of the precursor composition, porous thin film, method for preparation of the porous thin film, and semiconductor device

ULVAC INC

Manufacturing method of semiconductor device and semiconductor device produced therewith

ASM JAPAN

Method for forming porous insulation film

SANYO ELECTRIC CO

Semiconductor device and method of fabricating the same

KOHMURA KAZUO

Composition and method for production thereof, porous material and method for production thereof, interlayer insulating film, semiconductor material, semiconductor device, and low-refractive-index surface protection film

HYODO YASUYOSHI

Method for forming porous insulation film