P

Inventor

DARWISH MOHAMED N

US118 patents
⚠️ This page may combine multiple inventors who share the name “DARWISH MOHAMED N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SILICONIX INC

22 patents
US6084264AJul 4, 2000

Trench MOSFET having improved breakdown and on-resistance characteristics

SILICONIX INC209 citations99
US5895952AApr 20, 1999

Trench MOSFET with multi-resistivity drain to provide low on-resistance

SILICONIX INC162 citations99
US6140678AOct 31, 2000

Trench-gated power MOSFET with protective diode

SILICONIX INC92 citations98
US7795675B2Sep 14, 2010

Termination for trench MIS device

SILICONIX INC99 citations97
US7009247B2Mar 7, 2006

Trench MIS device with thick oxide layer in bottom of gate contact trench

SILICONIX INC46 citations96
US6008520ADec 28, 1999

Trench MOSFET with heavily doped delta layer to provide low on- resistance

SILICONIX INC84 citations96
US5674766AOct 7, 1997

Method of making a trench MOSFET with multi-resistivity drain to provide low on-resistance by varying dopant concentration in epitaxial layer

SILICONIX INC93 citations96
US7033876B2Apr 25, 2006

Trench MIS device having implanted drain-drift region and thick bottom oxide and process for manufacturing the same

SILICONIX INC28 citations93
US6927451B1Aug 9, 2005

Termination for trench MIS device having implanted drain-drift region

SILICONIX INC29 citations93
US6764906B2Jul 20, 2004

Method for making trench mosfet having implanted drain-drift region

SILICONIX INC44 citations93
US6600193B2Jul 29, 2003

Trench MOSFET having implanted drain-drift region

SILICONIX INC24 citations93
US6569738B2May 27, 2003

Process for manufacturing trench gated MOSFET having drain/drift region

SILICONIX INC31 citations93
US5688725ANov 18, 1997

Method of making a trench mosfet with heavily doped delta layer to provide low on-resistance

SILICONIX INC49 citations93
US7045857B2May 16, 2006

Termination for trench MIS device having implanted drain-drift region

SILICONIX INC24 citations92
US6921697B2Jul 26, 2005

Method for making trench MIS device with reduced gate-to-drain capacitance

SILICONIX INC31 citations92
US6903412B2Jun 7, 2005

Trench MIS device with graduated gate oxide layer

SILICONIX INC21 citations92
US6882000B2Apr 19, 2005

Trench MIS device with reduced gate-to-drain capacitance

SILICONIX INC24 citations92
US6875657B2Apr 5, 2005

Method of fabricating trench MIS device with graduated gate oxide layer

SILICONIX INC17 citations92
US6348712B1Feb 19, 2002

High density trench-gated power MOSFET

SILICONIX INC43 citations92
US7291884B2Nov 6, 2007

Trench MIS device having implanted drain-drift region and thick bottom oxide

SILICONIX INC16 citations91
US7012005B2Mar 14, 2006

Self-aligned differential oxidation in trenches by ion implantation

SILICONIX INC21 citations91
US6709930B2Mar 23, 2004

Thicker oxide formation at the trench bottom by selective oxide deposition

SILICONIX INC24 citations91

MAXPOWER SEMICONDUCTOR INC

11 patents

DARWISH MOHAMED N

9 patents

ZENG JUN

5 patents

AT & T BELL LAB

1 patent

NAT SEMICONDUCTOR CORP

1 patent

VISHAY SILICONIX

1 patent

Showing the top 50 of 118 patents by PatentIndex Score.