Inventor
METZ MATTHEW
US68 patents
⚠️ This page may combine multiple inventors who share the name “METZ MATTHEW”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
40 patentsUS7518196B2Apr 14, 2009
Field effect transistor with narrow bandgap source and drain regions and method of fabrication
INTEL CORP72 citations99
US7893506B2Feb 22, 2011
Field effect transistor with narrow bandgap source and drain regions and method of fabrication
INTEL CORP35 citations96
US8368135B2Feb 5, 2013
Field effect transistor with narrow bandgap source and drain regions and method of fabrication
INTEL CORP8 citations93
US7825481B2Nov 2, 2010
Field effect transistor with narrow bandgap source and drain regions and method of fabrication
INTEL CORP12 citations93
US7144783B2Dec 5, 2006
Reducing gate dielectric material to form a metal gate electrode extension
INTEL CORP37 citations93
US11444024B2Sep 13, 2022
Subtractively patterned interconnect structures for integrated circuits
INTEL CORP10 citations84
US10541305B2Jan 21, 2020
Group III-N nanowire transistors
INTEL CORP4 citations84
US10186581B2Jan 22, 2019
Group III-N nanowire transistors
INTEL CORP4 citations84
US9666492B2May 30, 2017
CMOS implementation of germanium and III-V nanowires and nanoribbons in gate-all-around architecture
INTEL CORP6 citations84
US9397188B2Jul 19, 2016
Group III-N nanowire transistors
INTEL CORP7 citations84
US8872225B2Oct 28, 2014
Defect transferred and lattice mismatched epitaxial film
INTEL CORP12 citations84
US9029835B2May 12, 2015
Epitaxial film on nanoscale structure
INTEL CORP13 citations82
US7425490B2Sep 16, 2008
Reducing reactions between polysilicon gate electrodes and high dielectric constant gate dielectrics
INTEL CORP7 citations74
US11335793B2May 17, 2022
Vertical tunneling field-effect transistors
INTEL CORP2 citations73
US11276694B2Mar 15, 2022
Transistor structure with indium phosphide channel
INTEL CORP2 citations73
US11257904B2Feb 22, 2022
Source-channel junction for III-V metal-oxide-semiconductor field effect transistors (MOSFETs)
INTEL CORP2 citations73
US11017843B2May 25, 2021
Thin film transistors for memory cell array layer selection
INTEL CORP3 citations73
US10784170B2Sep 22, 2020
CMOS implementation of germanium and III-V nanowires and nanoribbons in gate-all-around architecture
INTEL CORP3 citations73
US10319646B2Jun 11, 2019
CMOS implementation of germanium and III-V nanowires and nanoribbons in gate-all-around architecture
INTEL CORP3 citations73
US9947780B2Apr 17, 2018
High electron mobility transistor (HEMT) and method of fabrication
INTEL CORP4 citations73
US9691857B2Jun 27, 2017
Group III-N nanowire transistors
INTEL CORP2 citations73
US9685508B2Jun 20, 2017
High voltage field effect transistors
INTEL CORP3 citations73
US12027458B2Jul 2, 2024
Subtractively patterned interconnect structures for integrated circuits
INTEL CORP2 citations71
US11887988B2Jan 30, 2024
Thin film transistor structures with regrown source and drain
INTEL CORP1 citations63
US11862715B2Jan 2, 2024
Vertical tunneling field-effect transistors
INTEL CORP0 citations63
US11777013B2Oct 3, 2023
Channel formation for three dimensional transistors
INTEL CORP0 citations63
US12376342B2Jul 29, 2025
Passivation layers for thin film transistors
INTEL CORP0 citations62
US12100731B2Sep 24, 2024
Crystalline bottom electrode for perovskite capacitors and methods of fabrication
INTEL CORP0 citations62
US11955560B2Apr 9, 2024
Passivation layers for thin film transistors and methods of fabrication
INTEL CORP1 citations62
US11843054B2Dec 12, 2023
Vertical architecture of thin film transistors
INTEL CORP1 citations62
US11756998B2Sep 12, 2023
Source-channel junction for III-V metal-oxide-semiconductor field effect transistors (MOSFETs)
INTEL CORP0 citations62
US11527656B2Dec 13, 2022
Contact electrodes for vertical thin-film transistors
INTEL CORP1 citations62
US11522060B2Dec 6, 2022
Epitaxial layers on contact electrodes for thin- film transistors
INTEL CORP1 citations62
US12482744B2Nov 25, 2025
Subtractively patterned interconnect structures for integrated circuits
INTEL CORP0 citations61
US12266720B2Apr 1, 2025
Transistors with monocrystalline metal chalcogenide channel materials
INTEL CORP0 citations61
US11640984B2May 2, 2023
Transistor device with (anti)ferroelectric spacer structures
INTEL CORP0 citations61
US11444205B2Sep 13, 2022
Contact stacks to reduce hydrogen in thin film transistor
INTEL CORP1 citations60
US12394716B2Aug 19, 2025
Integrated circuit interconnect structures with graphene cap
INTEL CORP1 citations59
US12341065B2Jun 24, 2025
Deposition tool and method for filling deep trenches
INTEL CORP0 citations56
US11695081B2Jul 4, 2023
Channel layer formation for III-V metal-oxide-semiconductor field effect transistors (MOSFETs)
INTEL CORP0 citations52
THEN HAN WUI
3 patentsCHAU ROBERT S
3 patentsUS8183646B2May 22, 2012
Field effect transistor with narrow bandgap source and drain regions and method of fabrication
CHAU ROBERT S12 citations92
US8816394B2Aug 26, 2014
Field effect transistor with narrow bandgap source and drain regions and method of fabrication
CHAU ROBERT S3 citations73
US8664694B2Mar 4, 2014
Field effect transistor with narrow bandgap source and drain regions and method of fabrication
CHAU ROBERT S2 citations73
AIR LIQUIDE
2 patentsRADOSAVLJEVIC MARKO
1 patentDEWEY GILBERT
1 patentShowing the top 50 of 68 patents by PatentIndex Score.