P

Inventor

LIN CHUN-CHE

TW48 patents
⚠️ This page may combine multiple inventors who share the name “LIN CHUN-CHE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

37 patents
US9876114B2Jan 23, 2018

Structure and method for 3D FinFET metal gate

TAIWAN SEMICONDUCTOR MFG CO LTD61 citations98
US9437484B2Sep 6, 2016

Etch stop layer in integrated circuits

TAIWAN SEMICONDUCTOR MFG CO LTD28 citations93
US10367021B2Jul 30, 2019

Image sensor device and fabricating method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD12 citations92
US10998415B2May 4, 2021

Metal gate scheme for device and methods of forming

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10090242B2Oct 2, 2018

Etch stop layer in integrated circuits

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US9691766B1Jun 27, 2017

Fin field effect transistor and method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD16 citations82
US9466494B2Oct 11, 2016

Selective growth for high-aspect ration metal fill

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations82
US11522001B2Dec 6, 2022

Image sensor device

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10658252B2May 19, 2020

Semiconductor structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10522640B2Dec 31, 2019

Metal gate scheme for device and methods of forming

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10269664B2Apr 23, 2019

Semiconductor structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9941376B2Apr 10, 2018

Metal gate scheme for device and methods of forming

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10854713B2Dec 1, 2020

Method for forming trench structure of semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US9871100B2Jan 16, 2018

Trench structure of semiconductor device having uneven nitrogen distribution liner

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9722076B2Aug 1, 2017

Method for manufacturing semiconductor device with contamination improvement

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11257953B2Feb 22, 2022

Selective growth for high-aspect ratio metal fill

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10797176B2Oct 6, 2020

Selective growth for high-aspect ratio metal fill

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US9478660B2Oct 25, 2016

Protection layer on fin of fin field effect transistor (FinFET) device structure

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations63
US12464786B2Nov 4, 2025

Semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12272708B2Apr 8, 2025

Image sensor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11219115B2Jan 4, 2022

EUV collector contamination prevention

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11004973B2May 11, 2021

Semiconductor device with contamination improvement

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10957545B2Mar 23, 2021

Method for manufacturing semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10631392B2Apr 21, 2020

EUV collector contamination prevention

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11942419B2Mar 26, 2024

Etch stop layer in integrated circuits

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11404368B2Aug 2, 2022

Etch stop layer in integrated circuits

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10861701B2Dec 8, 2020

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10818716B2Oct 27, 2020

Image sensor device and fabricating method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9985133B2May 29, 2018

Protection layer on fin of fin field effect transistor (FinFET) device structure

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US9824943B2Nov 21, 2017

Semiconductor structure and method for forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10868063B2Dec 15, 2020

Surface treatment for BSI image sensors

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10720386B2Jul 21, 2020

Etch stop layer in integrated circuits

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10312366B2Jun 4, 2019

Semiconductor device with contamination improvement

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10109741B2Oct 23, 2018

Selective growth for high-aspect ratio metal fill

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9978793B2May 22, 2018

Surface treatment for BSI image sensors

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9847296B2Dec 19, 2017

Barrier layer and structure method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations40
US9601535B2Mar 21, 2017

Semiconducator image sensor having color filters formed over a high-K dielectric grid

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations38

LEXTAR ELECTRONICS CORP

3 patents

TAIWAN SEMICONDUCTOR MFG

2 patents

YU YI-CHENG

1 patent

NOVATEK MICROELECTRONICS CORP

1 patent

EPISTAR CORP

1 patent

LIN CHUN-CHE

1 patent

LIN JEN-CHUN

1 patent

UNITY OPTO TECHNOLOGY CO LTD

1 patent