Inventor

HIROSE YOSHIRO

JP149 patents

⚠️ This page may combine multiple inventors who share the name “HIROSE YOSHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HIROSE YOSHIRO

HITACHI INT ELECTRIC INC

Substrate processing apparatus for forming film including at least two different elements

Method of manufacturing semiconductor device and substrate processing apparatus

Method of manufacturing semiconductor device and substrate processing apparatus

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

Semiconductor device manufacturing method

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

Method of manufacturing semiconductor device by forming a film on a substrate

Method and apparatus of manufacturing a semiconductor device by forming a film on a substrate

Method of manufacturing semiconductor device by forming a film on a substrate

Method of manufacturing a semiconductor device by forming a film on a substrate

Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and non-transitory computer-readable recording medium

Method of manufacturing semiconductor device and substrate processing apparatus

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus and non-transitory computer-readable recording medium

Film forming method and recording medium for performing the method

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

Method of manufacturing semiconductor device and method of processing substrate

Method of manufacturing semiconductor device and method of processing substrate

Method of manufacturing semiconductor device and substrate processing apparatus

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing a semiconductor device by forming a film on a substrate

Method of manufacturing semiconductor device by forming a film on a substrate

Method of manufacturing a semiconductor device by forming a film on a substrate

Method of manufacturing semiconductor device by forming a film on a substrate

Semiconductor device manufacturing method, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

AKAE NAONORI

Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus

Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus

Method for manufacturing semiconductor device and substrate processing apparatus

Method of manufacturing semiconductor device and substrate processing apparatus

HITACHI-KOKUSAI ELECTRIC INC

Method of manufacturing semiconductor device for forming film including at least two different elements

Substrate processing apparatus capable of forming films including at least two different elements

Method of manufacturing semiconductor device for forming film including at least two different elements

Method of manufacturing semiconductor device for forming film including at least two different elements

HIROSE YOSHIRO

Method for manufacturing semiconductor device, method for processing substrate, substrate processing apparatus and recording medium

Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus

Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus

HOYA CORP

Process for producing polyurethane lens

HOWA MACHINERY LTD

Spare tool changing system for machining center

TAKASAWA YUSHIN

Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus for forming thin film containing at least two different elements

SASAJIMA RYOTA

Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus

OTA YOSUKE

Method of manufacturing semiconductor device and method of processing substrate and substrate processing apparatus

HITACHI KOKOSAI ELECTRIC INC

Method of forming an insulation film having low impurity concentrations

KOKUSAI ELECTRIC CORP

Method of manufacturing semiconductor device, recording medium, and substrate processing method