P

Inventor

GAZARD MARYSE

FR14 patents

Patents

14 patents
US4502934AMar 5, 1985

Electrode comprising an electrochrome polymer film and a display device using such an electrode

THOMSON CSF97 citations94
US4508639AApr 2, 1985

Polymers containing heterocycles and aromatic nuclei, and conductive organic materials made from such polymers

THOMSON CSF73 citations90
US4572840AFeb 25, 1986

Method of manufacturing an optical fiber with chiralic structure and a device for putting this method into practice

THOMSON CSF29 citations87
US4195108AMar 25, 1980

Electrolithographic process which makes it possible to improve the sensitivity of masking resins, and a mask obtained by this kind of process

THOMSON CSF9 citations73
US4153925AMay 8, 1979

Dielectric formed by a thin-layer polymer, a process for producing said layer and electrical capacitors comprising this dielectric

THOMSON CSF13 citations73
US4041190AAug 9, 1977

Method for producing a silica mask on a semiconductor substrate

THOMSON CSF17 citations73
US3989354ANov 2, 1976

Nematic liquid crystal of homeotropically aligned type and a method of manufacturing said device

THOMSON CSF15 citations73
US4414081ANov 8, 1983

Family of compounds crosslinkable by photon irradiation

THOMSON CSF6 citations72
US4481132ANov 6, 1984

High stability conductive polyacetylene material and process for the production thereof

THOMSON CSF8 citations70
US4315067AFeb 9, 1982

Method for making electron sensitive negative resist

THOMSON CSF9 citations70
US4853258AAug 1, 1989

Method for the impervious metallic coating of an optic fiber and device

THOMSON CSF8 citations68
US4285788AAug 25, 1981

Family of compounds crosslinkable by photon irradiation

THOMSON CSF4 citations61
US4259162AMar 31, 1981

Family of compounds crosslinkable by photon irradiation

THOMSON CSF1 citations61
US4068919AJan 17, 1978

Method of manufacturing an electron-sensitive resin, and an application of said resin to integrated optics

THOMSON CSF1 citations47