Inventor
SIEGERT JOERG
AT15 patents
⚠️ This page may combine multiple inventors who share the name “SIEGERT JOERG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AMS AG
13 patentsUS9852955B2Dec 26, 2017
Method and arrangement for analyzing a semiconductor element and method for manufacturing a semiconductor component
AMS AG6 citations79
US10283541B2May 7, 2019
Semiconductor device comprising an aperture array and method of producing such a semiconductor device
AMS AG2 citations72
US11107848B2Aug 31, 2021
Semiconductor device for detection of radiation and method of producing a semiconductor device for detection of radiation
AMS AG2 citations71
US10684412B2Jun 16, 2020
Semiconductor device with photonic and electronic functionality and method for manufacturing a semiconductor device
AMS AG2 citations71
US9753218B2Sep 5, 2017
Semiconductor device with integrated mirror and method of producing a semiconductor device with integrated mirror
AMS AG3 citations70
US10644047B2May 5, 2020
Optoelectronic device with a refractive element and a method of producing such an optoelectronic device
AMS AG0 citations51
US9929035B2Mar 27, 2018
Method of producing a removable wafer connection and carrier for wafer support
AMS AG1 citations51
US10332931B2Jun 25, 2019
Semiconductor device for wafer-scale integration
AMS AG0 citations50
US9608035B2Mar 28, 2017
Method of wafer-scale integration of semiconductor devices and semiconductor device
AMS AG0 citations50
US12100644B2Sep 24, 2024
Semiconductor device with through-substrate via and method of manufacturing a semiconductor device with through-substrate via
AMS AG0 citations49
US9991177B2Jun 5, 2018
Method and arrangement for analyzing a semiconductor element and method for manufacturing a semiconductor component
AMS AG0 citations47
US11271134B2Mar 8, 2022
Method for manufacturing an optical sensor and optical sensor
AMS AG0 citations46
US11572271B2Feb 7, 2023
Method for manufacturing an etch stop layer and MEMS sensor comprising an etch stop layer
AMS AG0 citations42