Inventor

WILLIAMSON DAVID M

US36 patents

⚠️ This page may combine multiple inventors who share the name “WILLIAMSON DAVID M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WILLIAMSON DAVID M

NIKON CORP

Projection optical system and method for photolithography and exposure apparatus and method using same

Projection optical system and method for photolithography and exposure apparatus and method using same

Optical objective for operation in EUV spectral region

Wide-angle pupil relay for cellphone-based fundus camera

Multispectral stereoscopic endoscope system and use of same

Wide-angle pupil relay for cellphone-based fundus camera

Illumination system with curved 1d-patterned mask for use in EUV-exposure tool

Euv lithography system for dense line patterning

Illumination system with flat 1D-patterned mask for use in EUV-exposure tool

EUV lithography system for dense line patterning

Extreme ultraviolet lithography system that utilizes pattern stitching

Extreme ultraviolet lithography system that utilizes pattern stitching

Optical system for convertible imaging of posterior and anterior portions of the eye

Catadioptric unit-magnification afocal pupil relay and optical imaging system employing the same

Catadioptric imaging systems for digital scanner

Non-telecentric multispectral stereoscopic endoscope objective

Broadband catadioptric microscope objective with small central obscuration

Catadioptric imaging systems for digital scanner

Methods and devices for reducing errors in Goos-Hänchen corrections of displacement data

Methods and devices for reducing errors in Goos-Hänchen corrections of displacement data

Imaging optical system configured with through the lens optics for producing control information

Ophthalmic optical system, ophthalmic objective lens, and ophthalmic device

Catadioptric imaging systems for digital scanner

SVG LITHOGRAPHY SYSTEMS INC

High numerical aperture ring field optical reduction system

Catadioptric optical reduction system with high numerical aperture

Four mirror EUV projection optics

High numerical aperture catadioptric lens

On-axix mask and wafer alignment system

WILLIAMSON DAVID M

Optical reduction system

High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations

High NA annular field catoptric projection optics using Zernike polynomial mirror surfaces

Exposure apparatus that utilizes multiple masks

AT & T CORP

Network based method of providing access to information

AT & T IP II LP

Network based method of providing access to information

AT & T IP I LP

Identifying redundant alarms by determining coefficients of correlation between alarm categories

SMITH DANIEL G

Variable attenuator device and method