Inventor

OUYANG CHRISTINE Y

TW21 patents

⚠️ This page may combine multiple inventors who share the name “OUYANG CHRISTINE Y”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OUYANG CHRISTINE Y

TAIWAN SEMICONDUCTOR MFG CO LTD

Ultraviolet radiation activated atomic layer deposition

Method for removing resist layer, method of forming a pattern and method of manufacturing a package

Method for removing photoresistor layer, method of forming a pattern and method of manufacturing a package

Extreme ultraviolet photolithography method with infiltration for enhanced sensitivity and etch resistance

Method for removing resist layer, method of forming a pattern and method of manufacturing a package

Ultraviolet radiation activated atomic layer deposition

Extreme ultraviolet photolithography method with infiltration for enhanced sensitivity and etch resistance

Patterning method and manufacturing method of semiconductor device

Extreme ultraviolet photolithography method with infiltration for enhanced sensitivity and etch resistance

Structure and formation method of semiconductor device with metal gate stack

Selective deposition by laser heating for forming a semiconductor structure

Etch selectivity improved by laser beam

Method for forming pattern and manufacturing method of package

APPLIED MATERIALS INC

Selective deposition process utilizing polymer structure deactivation process

Immersion field guided exposure and post-exposure bake process

Field guided post exposure bake application for photoresist microbridge defects

Apparatus for field guided acid profile control in a photoresist layer

Field guided post exposure bake application for photoresist microbridge defects

Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake

Laser annealing and electric field

Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake