Inventor

JENG CHI-CHERNG

TW117 patents

⚠️ This page may combine multiple inventors who share the name “JENG CHI-CHERNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JENG CHI-CHERNG

TAIWAN SEMICONDUCTOR MFG CO LTD

Image sensor device and method for forming the same

Structure and formation method of fin-like field effect transistor

Support structure for integrated circuitry

Structure and formation method of fin-like field effect transistor

Structure and formation method of fin-like field effect transistor

Pad structure layout for semiconductor device

FinFET gate structure and method for fabricating the same

Semiconductor structure

Support structure for integrated circuitry

Apparatus and method for fabricating a light guiding grid

Structure and formation method of fin-like field effect transistor

Semiconductor structures

FinFET with P/N stacked fins and method for fabricating the same

Fin field effect transistor and fabricating method thereof

Metal pad offset for multi-layer metal layout

Black level control for image sensors

Structure and formation method of fin-like field effect transistor

Image sensor and method for manufacturing thereof

Method for forming semiconductor device structure with conductive line

Image sensor and method for manufacturing thereof

Image sensor device and method for forming the same

Backside illuminated image sensor and method of manufacturing the same

Fin field effect transistor (finFET) device structure and method for forming the same

Method for forming fin field effect transistor (FINFET) device structure

FinFET gate structure and method for fabricating the same

Integrated circuit and manufacturing method thereof

Formation method of semiconductor device that includes performing hydrogen-containing plasma treatment on metal gate stack

Image sensor device with light blocking structure

Photomask and method for forming dual STI structure by using the same

Capacitor structure of integrated circuit chip and method of fabricating the same

Semiconductor structure

Metal gate stack having TaAlCN layer

Mechanisms for forming image sensor device

Protection layer on fin of fin field effect transistor (FinFET) device structure

Protection layer in CMOS image sensor array region

Method of manufracturing structure of dielectric grid for a semiconductor device

Structure and formation method of fin-like field effect transistor

Image sensor

TAIWAN SEMICONDUCTOR MFG

Metal gate stack having TaAlCN layer

Backside illuminated image sensor and method of manufacturing the same

Metal shield structure and methods for BSI image sensors

Deep trench isolation with air-gap in backside illumination image sensor chips

Image sensor with stacked grid structure

Dielectric film for image sensor

Metal gate stack having TiAICN as work function layer and/or blocking/wetting layer

Image sensor and manufacturing method thereof

Photodiode with concave reflector

Structure of dielectric grid with a metal pillar for semiconductor device

Structure of dielectric grid for a semiconductor device

IND TECH RES INST

Vertical nanotube transistor and process for fabricating the same