Inventor

LEE HSIN-CHANG

TW168 patents

⚠️ This page may combine multiple inventors who share the name “LEE HSIN-CHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEE HSIN-CHANG

TAIWAN SEMICONDUCTOR MFG CO LTD

Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof

Pellicle removal method

Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask

Pellicle fabrication methods and structures thereof

Pellicle structure and method for forming the same

Pellicle assembly and method for advanced lithography

Pellicle structures and methods of fabricating thereof

Pellicle assembly and method for advanced lithography

Network type pellicle membrane and method for forming the same

Extreme ultraviolet mask with alloy based absorbers

Pellicle assembly and method of making same

Pellicle having vent hole

Photomask including fiducial mark and method of making a semiconductor device using the photomask

EUV masks to prevent carbon contamination

Pellicle and method of using the same

Photomask including fiducial mark and method of making semiconductor device using the photomask

Reticle container

Method of manufacturing EUV photo masks

Extreme ultraviolet mask with reduced mask shadowing effect and method of manufacturing the same

Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask

Pellicle fabrication methods and structures thereof

Pellicle and method of using the same

Pellicle assembly and fabrication methods thereof

Assist feature for a photolithographic process

Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effect

Method of manufacturing photo masks

Photomask and method of fabricating a photomask

Cleaning method for photo masks and apparatus therefor

Method of fabricating and servicing a photomask

Pellicle assembly and method for advanced lithography

Mask for extreme ultraviolet photolithography

EUV photo masks and manufacturing method thereof

Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same

Particle removing assembly and method of cleaning mask for lithography

Particle removing assembly and method of cleaning mask for lithography

Lithography mask with a black border regions and method of fabricating the same

Lithography mask with a black border region and method of fabricating the same

Treating a capping layer of a mask

Method and device for cleaning substrates

TAIWAN SEMICONDUCTOR MFG

Reflective mask and method of making same

Pellicle stress relief

Multiple resist layer phase shift mask (PSM) blank and PSM formation method

Photomask and method for forming the same

LEE HSIN-CHANG

Method of fabricating a lithography mask

Reduce mask overlay error by removing film deposited on blank of mask

Method of making a lithography mask

HSU PEI-CHENG

Reflective mask and method of making same

CHEN CHIA-JEN

Mask and method for forming the mask

SHIH CHIA-TSUNG

Phase shift mask for extreme ultraviolet lithography and method of fabricating same

STANLEY BLACK & DECKER INC

Tool storage box