Inventor

LIN YUN-YUE

TW69 patents

⚠️ This page may combine multiple inventors who share the name “LIN YUN-YUE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN YUN-YUE

TAIWAN SEMICONDUCTOR MFG CO LTD

Structure of pellicle-mask structure with vent structure

Pellicle removal method

Pellicle for an EUV lithography mask and a method of manufacturing thereof

Pellicle fabrication methods and structures thereof

Pellicle structure and method for forming the same

Pellicle assembly and method for advanced lithography

Pellicle structures and methods of fabricating thereof

Pellicle assembly and method for advanced lithography

Pellicle having vent hole

Method for forming structure of pellicle-mask structure with vent structure

Extreme ultraviolet mask and method for forming the same

Extreme ultraviolet mask and method of manufacturing the same

Pellicle for an EUV lithography mask and a method of manufacturing thereof

Pellicle design for mask

Pellicle and method of using the same

Pellicle design for mask application

Mask for EUV lithography and method of manufacturing the same

Extreme ultraviolet mask and method for forming the same

Pellicle for an EUV lithography mask and a method of manufacturing thereof

Extreme ultraviolet mask with reduced mask shadowing effect and method of manufacturing the same

Extreme ultraviolet mask and method of manufacturing the same

Mask for EUV lithography and method of manufacturing the same

Pellicle fabrication methods and structures thereof

Pellicle and method of using the same

Pellicle assembly and method for advanced lithography

Pellicle and method for manufacturing the same

Pellicle and method of using the same

Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same

Chromeless phase shift mask structure and process

Chromeless phase shift mask structure and process

Pellicle for an EUV lithography mask and a method of manufacturing thereof

Method for forming structure of pellicle-mask structure with vent structure

Mask for EUV lithography and method of manufacturing the same

Extreme ultraviolet mask and method for forming the same

Pellicle design for mask application

Extreme ultraviolet mask and method of manufacturing the same

EUV photo masks and manufacturing method thereof

Pellicle for an EUV lithography mask and a method of manufacturing thereof

Pellicle for an EUV lithography mask and a method of manufacturing thereof

Pellicle for an EUV lithography mask and a method of manufacturing thereof

Extreme ultraviolet lithography method using robust, high transmission pellicle

EUV photo masks and manufacturing method thereof

Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof

Robust, high transmission pellicle for extreme ultraviolet lithography systems

EUV photo masks and manufacturing method thereof

Robust, high transmission pellicle for extreme ultraviolet lithography systems

Mask and method for forming the same

LEE HSIN-CHANG

Method of fabricating a lithography mask

Method of making a lithography mask

TAIWAN SEMICONDUCTOR MFG

Apparatus of repairing a mask and a method for the same