Inventor
FAIR JAMES A
US21 patents
⚠️ This page may combine multiple inventors who share the name “FAIR JAMES A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NOVELLUS SYSTEMS INC
14 patentsUS6849122B1Feb 1, 2005
Thin layer metal chemical vapor deposition
NOVELLUS SYSTEMS INC115 citations99
US6464779B1Oct 15, 2002
Copper atomic layer chemical vapor desposition
NOVELLUS SYSTEMS INC195 citations99
US7897215B1Mar 1, 2011
Sequential UV induced chemical vapor deposition
NOVELLUS SYSTEMS INC524 citations98
US7144806B1Dec 5, 2006
ALD of tantalum using a hydride reducing agent
NOVELLUS SYSTEMS INC312 citations98
US7005372B2Feb 28, 2006
Deposition of tungsten nitride
NOVELLUS SYSTEMS INC187 citations98
US6844258B1Jan 18, 2005
Selective refractory metal and nitride capping
NOVELLUS SYSTEMS INC260 citations98
US6720260B1Apr 13, 2004
Sequential electron induced chemical vapor deposition
NOVELLUS SYSTEMS INC485 citations98
US7691749B2Apr 6, 2010
Deposition of tungsten nitride
NOVELLUS SYSTEMS INC97 citations97
US6627268B1Sep 30, 2003
Sequential ion, UV, and electron induced chemical vapor deposition
NOVELLUS SYSTEMS INC490 citations97
US7157798B1Jan 2, 2007
Selective refractory metal and nitride capping
NOVELLUS SYSTEMS INC68 citations96
US6905543B1Jun 14, 2005
Methods of forming tungsten nucleation layer
NOVELLUS SYSTEMS INC68 citations96
US7107998B2Sep 19, 2006
Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus
NOVELLUS SYSTEMS INC74 citations94
US7014709B1Mar 21, 2006
Thin layer metal chemical vapor deposition
NOVELLUS SYSTEMS INC18 citations92
US7176140B1Feb 13, 2007
Adhesion promotion for etch by-products
NOVELLUS SYSTEMS INC12 citations84
ADVANCED TECH MATERIALS
2 patentsUS5741363AApr 21, 1998
Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition
ADVANCED TECH MATERIALS59 citations96
US6010748AJan 4, 2000
Method of delivering source reagent vapor mixtures for chemical vapor deposition using interiorly partitioned injector
ADVANCED TECH MATERIALS40 citations93