Inventor
DORNFEST CHARLES
US30 patents
⚠️ This page may combine multiple inventors who share the name “DORNFEST CHARLES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
29 patentsUS6129044AOct 10, 2000
Apparatus for substrate processing with improved throughput and yield
APPLIED MATERIALS INC578 citations99
US6099651AAug 8, 2000
Temperature controlled chamber liner
APPLIED MATERIALS INC360 citations99
US6056823AMay 2, 2000
Temperature controlled gas feedthrough
APPLIED MATERIALS INC167 citations99
US5882424AMar 16, 1999
Plasma cleaning of a CVD or etch reactor using a low or mixed frequency excitation field
APPLIED MATERIALS INC325 citations99
US5846332ADec 8, 1998
Thermally floating pedestal collar in a chemical vapor deposition chamber
APPLIED MATERIALS INC863 citations99
US6258170B1Jul 10, 2001
Vaporization and deposition apparatus
APPLIED MATERIALS INC307 citations98
US6210485B1Apr 3, 2001
Chemical vapor deposition vaporizer
APPLIED MATERIALS INC450 citations98
US5968379AOct 19, 1999
High temperature ceramic heater assembly with RF capability and related methods
APPLIED MATERIALS INC262 citations98
US5964947AOct 12, 1999
Removable pumping channel liners within a chemical vapor deposition chamber
APPLIED MATERIALS INC96 citations98
US5558717ASep 24, 1996
CVD Processing chamber
APPLIED MATERIALS INC1,163 citations98
US5531835AJul 2, 1996
Patterned susceptor to reduce electrostatic force in a CVD chamber
APPLIED MATERIALS INC852 citations98
US6527865B1Mar 4, 2003
Temperature controlled gas feedthrough
APPLIED MATERIALS INC89 citations97
US6358810B1Mar 19, 2002
Method for superior step coverage and interface control for high K dielectric capacitors and related electrodes
APPLIED MATERIALS INC154 citations97
US6066209AMay 23, 2000
Cold trap
APPLIED MATERIALS INC80 citations97
US6616767B2Sep 9, 2003
High temperature ceramic heater assembly with RF capability
APPLIED MATERIALS INC114 citations96
US6270859B2Aug 7, 2001
Plasma treatment of titanium nitride formed by chemical vapor deposition
APPLIED MATERIALS INC42 citations96
US6165271ADec 26, 2000
Temperature controlled process and chamber lid
APPLIED MATERIALS INC49 citations96
US6096134AAug 1, 2000
Liquid delivery system
APPLIED MATERIALS INC23 citations96
US6082714AJul 4, 2000
Vaporization apparatus and process
APPLIED MATERIALS INC32 citations96
US6063199AMay 16, 2000
Temperature controlled liner
APPLIED MATERIALS INC23 citations96
US5853607ADec 29, 1998
CVD processing chamber
APPLIED MATERIALS INC91 citations96
US5994678ANov 30, 1999
Apparatus for ceramic pedestal and metal shaft assembly
APPLIED MATERIALS INC89 citations95
US5496142AMar 5, 1996
Slotted conical spring washer
APPLIED MATERIALS INC75 citations95
US6077562AJun 20, 2000
Method for depositing barium strontium titanate
APPLIED MATERIALS INC19 citations93
US5454903AOct 3, 1995
Plasma cleaning of a CVD or etch reactor using helium for plasma stabilization
APPLIED MATERIALS INC59 citations93
US6214160B1Apr 10, 2001
Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers
APPLIED MATERIALS INC23 citations91
US5779807AJul 14, 1998
Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers
APPLIED MATERIALS INC41 citations91
US5705225AJan 6, 1998
Method of filling pores in anodized aluminum parts
APPLIED MATERIALS INC33 citations88
US6123773ASep 26, 2000
Gas manifold
APPLIED MATERIALS INC10 citations82