Inventor
SAENGER ANNETTE
DE19 patents
⚠️ This page may combine multiple inventors who share the name “SAENGER ANNETTE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
17 patentsUS6835417B2Dec 28, 2004
Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processes
INFINEON TECHNOLOGIES AG115 citations98
US6542054B2Apr 1, 2003
Acoustic mirror and method for producing the acoustic mirror
INFINEON TECHNOLOGIES AG36 citations91
US6774005B2Aug 10, 2004
Method for fabricating a metal carbide layer and method for fabricating a trench capacitor containing a metal carbide
INFINEON TECHNOLOGIES AG9 citations73
US6821187B2Nov 23, 2004
Method for chemical-mechanical polishing of a layer which is a substrate and is a metal selected from a platinum group
INFINEON TECHNOLOGIES AG9 citations71
US7273790B2Sep 25, 2007
Method for fabricating trench capacitor with insulation collar electrically connected to substrate through buried contact, in particular, for a semiconductor memory cell
INFINEON TECHNOLOGIES AG2 citations63
US7199414B2Apr 3, 2007
Stress-reduced layer system for use in storage capacitors
INFINEON TECHNOLOGIES AG3 citations63
US6916704B2Jul 12, 2005
Multiple deposition of metal layers for the fabrication of an upper capacitor electrode of a trench capacitor
INFINEON TECHNOLOGIES AG6 citations63
US6998307B2Feb 14, 2006
Method for fabricating a storage capacitor
INFINEON TECHNOLOGIES AG4 citations62
US6987295B2Jan 17, 2006
Trench capacitor and method for fabricating the trench capacitor
INFINEON TECHNOLOGIES AG6 citations62
US6943393B2Sep 13, 2005
Memory cell arrangement and method of fabricating it
INFINEON TECHNOLOGIES AG4 citations62
US6767581B2Jul 27, 2004
Process for the deposition of thin layers by chemical vapor deposition
INFINEON TECHNOLOGIES AG5 citations62
US6686265B2Feb 3, 2004
Method of producing a capacitor electrode with a barrier structure
INFINEON TECHNOLOGIES AG6 citations61
US7129173B2Oct 31, 2006
Process for producing and removing a mask layer
INFINEON TECHNOLOGIES AG3 citations58
US7078309B2Jul 18, 2006
Methods for producing a structured metal layer
INFINEON TECHNOLOGIES AG0 citations51
US6797613B2Sep 28, 2004
Process for depositing WSix layers on a high topography with a defined stoichiometry
INFINEON TECHNOLOGIES AG1 citations50
US10199372B2Feb 5, 2019
Monolithically integrated chip including active electrical components and passive electrical components with chip edge stabilization structures
INFINEON TECHNOLOGIES AG0 citations48
US6960524B2Nov 1, 2005
Method for production of a metallic or metal-containing layer
INFINEON TECHNOLOGIES AG0 citations42