Inventor
PARTHIER LUTZ
DE20 patents
⚠️ This page may combine multiple inventors who share the name “PARTHIER LUTZ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SCHOTT AG
14 patentsUS7679806B2Mar 16, 2010
Method for making optical elements for microlithography, the lens systems obtained by the method and their uses
SCHOTT AG9 citations81
US7534412B2May 19, 2009
Large-volume CaF2 single crystals with reduced scattering and improved laser stability, and uses thereof
SCHOTT AG5 citations70
US7476274B2Jan 13, 2009
Method and apparatus for making a highly uniform low-stress single crystal by drawing from a melt and uses of said crystal
SCHOTT AG6 citations70
US11091383B2Aug 17, 2021
Structured plate-like glass element and process for the production thereof
SCHOTT AG2 citations69
US12017943B2Jun 25, 2024
Structured plate-like glass element and process for the production thereof
SCHOTT AG0 citations60
US12297137B2May 13, 2025
Structured plate-like glass element and process for the production thereof
SCHOTT AG0 citations59
US7868708B2Jan 11, 2011
Method and apparatus for making a highly uniform low-stress single crystal by drawing from a melt and uses of said crystal
SCHOTT AG3 citations59
US7393409B2Jul 1, 2008
Method for making large-volume CaF2 single cystals with reduced scattering and improved laser stability, the crystals made by the method and uses thereof
SCHOTT AG5 citations59
US7344595B2Mar 18, 2008
Method and apparatus for purification of crystal material and for making crystals therefrom and use of crystals obtained thereby
SCHOTT AG5 citations57
US7303627B2Dec 4, 2007
Method for making low-stress large-volume not-(111)-oriented crystals with reduced stress birefringence and more uniform refractive index and crystals made thereby
SCHOTT AG1 citations48
US7742156B2Jun 22, 2010
Method of testing optical materials by irradiating with high energy density radiation, optical materials selected by said method and uses thereof
SCHOTT AG1 citations46
US7522270B2Apr 21, 2009
Method for determination of irreversible radiation damage of optical materials
SCHOTT AG0 citations46
US7688444B2Mar 30, 2010
Method of determining laser stabilities of optical materials, crystals selected according to said method, and uses of said selected crystals
SCHOTT AG0 citations44
US6932864B2Aug 23, 2005
Method and apparatus for measuring the position of a phase interface during crystal growth
SCHOTT AG0 citations39
HELLMA MATERIALS GMBH & CO KG
4 patentsUS7837969B2Nov 23, 2010
Method of making large-volume CaF2 single crystals for optical elements with an optic axis parallel to the (100)-or (110)-crystal axis and CaF2 single crystal made thereby
HELLMA MATERIALS GMBH & CO KG3 citations59
US7883578B2Feb 8, 2011
Process for preparing CaF2 lens blanks especially for 193 nm and 157 nm lithography with minimized deffects
HELLMA MATERIALS GMBH & CO KG3 citations56
US7873084B2Jan 18, 2011
Arrangement and method for preventing the depolarization of linear-polarized light during the transmission of light through crystals
HELLMA MATERIALS GMBH & CO KG0 citations49
US7968074B2Jun 28, 2011
Method for making low-stress large-volume crystals with reduced stress birefringence and more uniform refractive index and crystals made thereby
HELLMA MATERIALS GMBH & CO KG0 citations36