Inventor

TAN SIA KIM

SG22 patents

⚠️ This page may combine multiple inventors who share the name “TAN SIA KIM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAN SIA KIM

CHARTERED SEMICONDUCTOR MFG

Polarizing photolithography system

Half tone alternating phase shift masks

Method to resolve line end distortion for alternating phase shift mask

System and method for phase shift assignment

Anti-reflective sidewall coated alternating phase shift mask and fabrication method

Integrated circuit system employing dipole multiple exposure

Method and apparatus for contact hole unit cell formation

Method for dual damascene patterning with single exposure using tri-tone phase shift mask

Mask and method to pattern chromeless phase lithography contact hole

Reticle system for manufacturing integrated circuit systems

Phase shifting photolithography system

Cross technology reticles

Monitoring structure

Integrated circuit system with assist feature

Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask

GLOBALFOUNDRIES SG PTE LTD

Method and apparatus for removing radiation side lobes

Integrated circuit system employing multiple exposure dummy patterning technology

Pellicles and devices comprising a photomask and the pellicle

TAN SIA KIM

Mask and method to pattern chromeless phase lithography contact hole

Mask system employing substantially circular optical proximity correction target and method of manufacture thereof

ZHOU WENZHAN

Liquid immersion scanning exposure system using an immersion liquid confined within a lens hood

GLOBAL FOUNDRIES SINGAPORE PTE LTD

Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask