Inventor
NAKAHARA KAZUO
JP13 patents
⚠️ This page may combine multiple inventors who share the name “NAKAHARA KAZUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
6 patentsUS8927201B2Jan 6, 2015
Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition
JSR CORP4 citations72
US9513548B2Dec 6, 2016
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
JSR CORP2 citations60
US10048586B2Aug 14, 2018
Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
JSR CORP0 citations51
US9323146B2Apr 26, 2016
Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base
JSR CORP1 citations51
US9304393B2Apr 5, 2016
Radiation-sensitive resin composition and compound
JSR CORP1 citations51
US8609321B2Dec 17, 2013
Radiation-sensitive resin composition, polymer and compound
JSR CORP0 citations51
NAKAHARA KAZUO
4 patentsUS8609318B2Dec 17, 2013
Radiation-sensitive resin composition, method for forming resist pattern and polymer
NAKAHARA KAZUO2 citations59
US8697335B2Apr 15, 2014
Radiation-sensitive resin composition and compound
NAKAHARA KAZUO1 citations50
US8647810B2Feb 11, 2014
Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device
NAKAHARA KAZUO1 citations49
US8603726B2Dec 10, 2013
Radiation-sensitive resin composition, polymer and compound
NAKAHARA KAZUO1 citations49