P

Inventor

INATOMI YUICHIRO

JP38 patents
⚠️ This page may combine multiple inventors who share the name “INATOMI YUICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

30 patents
US7875420B2Jan 25, 2011

Method for improving surface roughness of processed film of substrate and apparatus for processing substrate

TOKYO ELECTRON LTD11 citations84
US7819076B2Oct 26, 2010

Substrate treatment method and substrate treatment apparatus

TOKYO ELECTRON LTD9 citations84
US7989156B2Aug 2, 2011

Substrate treatment method and substrate treatment apparatus

TOKYO ELECTRON LTD5 citations73
US10731256B2Aug 4, 2020

Plating apparatus, plating method, and recording medium

TOKYO ELECTRON LTD2 citations72
US12564868B2Mar 3, 2026

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD0 citations62
US11004684B2May 11, 2021

Forming method of hard mask

TOKYO ELECTRON LTD0 citations62
US11795546B2Oct 24, 2023

Substrate liquid processing apparatus, substrate liquid processing method and recording medium

TOKYO ELECTRON LTD0 citations61
US11519074B2Dec 6, 2022

Plating method and recording medium

TOKYO ELECTRON LTD0 citations61
US8343714B2Jan 1, 2013

Resist applying and developing method, resist film processing unit, and resist applying and developing apparatus comprising the unit

TOKYO ELECTRON LTD2 citations61
US7714979B2May 11, 2010

Substrate processing apparatus

TOKYO ELECTRON LTD3 citations61
US12404587B2Sep 2, 2025

Substrate processing apparatus and substrate processing method

TOKYO ELECTRON LTD0 citations60
US9847239B2Dec 19, 2017

Substrate processing apparatus

TOKYO ELECTRON LTD1 citations52
US9761485B2Sep 12, 2017

Catalyst layer forming method, catalyst layer forming system, and recording medium

TOKYO ELECTRON LTD0 citations52
US9552994B2Jan 24, 2017

Plating apparatus, plating method, and storage medium

TOKYO ELECTRON LTD0 citations52
US9016231B2Apr 28, 2015

Substrate processing method and substrate processing system

TOKYO ELECTRON LTD0 citations52
US8848161B2Sep 30, 2014

Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method

TOKYO ELECTRON LTD0 citations52
US11230767B2Jan 25, 2022

Plating method, plating apparatus and recording medium

TOKYO ELECTRON LTD0 citations51
US11028483B2Jun 8, 2021

Plating method, plating apparatus and recording medium

TOKYO ELECTRON LTD0 citations51
US10784111B2Sep 22, 2020

Plating method, plating apparatus and recording medium

TOKYO ELECTRON LTD0 citations51
US10354915B2Jul 16, 2019

Adhesion layer forming method, adhesion layer forming system and recording medium

TOKYO ELECTRON LTD0 citations51
US10224202B2Mar 5, 2019

Forming method of hard mask, forming apparatus of hard mask and recording medium

TOKYO ELECTRON LTD0 citations51
US9966306B2May 8, 2018

Catalyst layer forming method, catalyst layer forming system and recording medium

TOKYO ELECTRON LTD1 citations51
US9523153B2Dec 20, 2016

Pre-treatment method for plating and storage medium

TOKYO ELECTRON LTD0 citations51
US7600933B2Oct 13, 2009

Substrate processing apparatus

TOKYO ELECTRON LTD1 citations51
US12281390B2Apr 22, 2025

Substrate liquid processing apparatus for supplying temperature-controlled plating liquid

TOKYO ELECTRON LTD0 citations43
US9922835B2Mar 20, 2018

Plating method, plating apparatus, and storage medium

TOKYO ELECTRON LTD0 citations42
US9487865B2Nov 8, 2016

Plating apparatus, plating method and storage medium

TOKYO ELECTRON LTD0 citations42
US10179950B2Jan 15, 2019

Plating method, plated component, and plating system

TOKYO ELECTRON LTD0 citations41
US10030308B2Jul 24, 2018

Plating method, plating system and storage medium

TOKYO ELECTRON LTD0 citations41
US9837308B2Dec 5, 2017

Plating method, plating system and storage medium

TOKYO ELECTRON LTD0 citations41

INATOMI YUICHIRO

8 patents