Inventor

FELER YOEL

IL36 patents

⚠️ This page may combine multiple inventors who share the name “FELER YOEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FELER YOEL

KLA TENCOR CORP

Symmetric target design in scatterometry overlay metrology

Method and system for providing a target design displaying high sensitivity to scanner focus change

Symmetric target design in scatterometry overlay metrology

Phase characterization of targets

Estimation of asymmetric aberrations

Method and system for selection of metrology targets for use in focus and dose applications

Approach for model calibration used for focus and dose measurement

Metrology targets and methods with oblique periodic structures

Determining the impacts of stochastic behavior on overlay metrology data

Near field metrology

Method, system, and user interface for metrology target characterization

Focus measurements using scatterometry metrology

Reticle optimization algorithms and optimal target design

Reduction or elimination of pattern placement error in metrology measurements

Reduction or elimination of pattern placement error in metrology measurements

Focus metrology and targets which utilize transformations based on aerial images of the targets

Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein

Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein

Accuracy improvements in optical metrology

KLA CORP

Metrology target for scanning metrology

Metrology methods and optical schemes for measurement of misregistration by using hatched target designs

Misregistration metrology by using fringe Moiré and optical Moiré effects

Periodic semiconductor device misregistration metrology system and method

Imaging overlay targets using moiré elements and rotational symmetry arrangements

Overlay mark design for electron beam overlay

Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology

Metrology target for scanning metrology

Robust and accurate overlay target design for CMP

Self-Moire grating design for use in metrology

Imaging overlay targets using Moiré elements and rotational symmetry arrangements

Overlay mark design for electron beam overlay

Multi-layered moiré targets and methods for using the same in measuring misregistration of semiconductor devices

Measurement of stitching error using split targets

Induced displacements for improved overlay error metrology

Metrology target for one-dimensional measurement of periodic misregistration

Overlay design for electron beam and scatterometry overlay measurements