P

Inventor

AMIR NURIEL

IL35 patents
⚠️ This page may combine multiple inventors who share the name “AMIR NURIEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KLA TENCOR CORP

23 patents
US10527951B2Jan 7, 2020

Compound imaging metrology targets

KLA TENCOR CORP18 citations85
US9885961B1Feb 6, 2018

Partly disappearing targets

KLA TENCOR CORP8 citations84
US9329033B2May 3, 2016

Method for estimating and correcting misregistration target inaccuracy

KLA TENCOR CORP8 citations82
US10890436B2Jan 12, 2021

Overlay targets with orthogonal underlayer dummyfill

KLA TENCOR CORP4 citations73
US9903813B2Feb 27, 2018

Overlay measurement of pitch walk in multiply patterned targets

KLA TENCOR CORP2 citations73
US9841370B2Dec 12, 2017

Multi-layered target design

KLA TENCOR CORP5 citations73
US9760020B2Sep 12, 2017

In-situ metrology

KLA TENCOR CORP3 citations73
US10551749B2Feb 4, 2020

Metrology targets with supplementary structures in an intermediate layer

KLA TENCOR CORP3 citations72
US10415963B2Sep 17, 2019

Estimating and eliminating inter-cell process variation inaccuracy

KLA TENCOR CORP2 citations72
US10303835B2May 28, 2019

Method and apparatus for direct self assembly in target design and production

KLA TENCOR CORP2 citations72
US10002806B2Jun 19, 2018

Metrology targets with filling elements that reduce inaccuracies and maintain contrast

KLA TENCOR CORP6 citations72
US9903711B2Feb 27, 2018

Feed forward of metrology data in a metrology system

KLA TENCOR CORP5 citations71
US10726169B2Jul 28, 2020

Target and process sensitivity analysis to requirements

KLA TENCOR CORP3 citations70
US10242290B2Mar 26, 2019

Method, system, and user interface for metrology target characterization

KLA TENCOR CORP2 citations69
US9934353B2Apr 3, 2018

Focus measurements using scatterometry metrology

KLA TENCOR CORP5 citations69
US11709433B2Jul 25, 2023

Device-like metrology targets

KLA TENCOR CORP0 citations62
US11060845B2Jul 13, 2021

Polarization measurements of metrology targets and corresponding target designs

KLA TENCOR CORP0 citations62
US10698321B2Jun 30, 2020

Process compatible segmented targets and design methods

KLA TENCOR CORP1 citations62
US10458777B2Oct 29, 2019

Polarization measurements of metrology targets and corresponding target designs

KLA TENCOR CORP0 citations52
US10025285B2Jul 17, 2018

On-product derivation and adjustment of exposure parameters in a directed self-assembly process

KLA TENCOR CORP0 citations52
US9753364B2Sep 5, 2017

Producing resist layers using fine segmentation

KLA TENCOR CORP0 citations52
US9740108B2Aug 22, 2017

Scatterometry overlay metrology targets and methods

KLA TENCOR CORP0 citations52
US10008364B2Jun 26, 2018

Alignment of multi-beam patterning tool

KLA TENCOR CORP0 citations42

KORNIT DIGITAL LTD

6 patents

BAR-SADEH EYAL

2 patents

AMIR NURIEL

1 patent

KLA CORP

1 patent

HIGHCON SYSTEMS LTD

1 patent

HALABI SHAUL

1 patent