Inventor
AMIT ERAN
IL32 patents
⚠️ This page may combine multiple inventors who share the name “AMIT ERAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
28 patentsUS10473460B2Nov 12, 2019
Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals
KLA TENCOR CORP20 citations91
US11248905B2Feb 15, 2022
Machine learning in metrology measurements
KLA TENCOR CORP8 citations85
US10527951B2Jan 7, 2020
Compound imaging metrology targets
KLA TENCOR CORP18 citations85
US8913237B2Dec 16, 2014
Device-like scatterometry overlay targets
KLA TENCOR CORP9 citations84
US9329033B2May 3, 2016
Method for estimating and correcting misregistration target inaccuracy
KLA TENCOR CORP8 citations82
US11119417B2Sep 14, 2021
Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)
KLA TENCOR CORP5 citations73
US11085754B2Aug 10, 2021
Enhancing metrology target information content
KLA TENCOR CORP2 citations73
US10685165B2Jun 16, 2020
Metrology using overlay and yield critical patterns
KLA TENCOR CORP2 citations73
US10551749B2Feb 4, 2020
Metrology targets with supplementary structures in an intermediate layer
KLA TENCOR CORP3 citations72
US10415963B2Sep 17, 2019
Estimating and eliminating inter-cell process variation inaccuracy
KLA TENCOR CORP2 citations72
US10303835B2May 28, 2019
Method and apparatus for direct self assembly in target design and production
KLA TENCOR CORP2 citations72
US10274837B2Apr 30, 2019
Metrology target for combined imaging and scatterometry metrology
KLA TENCOR CORP5 citations72
US10571811B2Feb 25, 2020
Device metrology targets and methods
KLA TENCOR CORP5 citations71
US10365230B1Jul 30, 2019
Scatterometry overlay based on reflection peak locations
KLA TENCOR CORP3 citations71
US9874527B2Jan 23, 2018
Removing process-variation-related inaccuracies from scatterometry measurements
KLA TENCOR CORP3 citations71
US10622238B2Apr 14, 2020
Overlay measurement using phase and amplitude modeling
KLA TENCOR CORP4 citations70
US11709433B2Jul 25, 2023
Device-like metrology targets
KLA TENCOR CORP0 citations62
US11067904B2Jul 20, 2021
System for combined imaging and scatterometry metrology
KLA TENCOR CORP0 citations62
US11060845B2Jul 13, 2021
Polarization measurements of metrology targets and corresponding target designs
KLA TENCOR CORP0 citations62
US11054752B2Jul 6, 2021
Device metrology targets and methods
KLA TENCOR CORP0 citations61
US10763146B2Sep 1, 2020
Recipe optimization based zonal analysis
KLA TENCOR CORP1 citations59
US10699969B2Jun 30, 2020
Quick adjustment of metrology measurement parameters according to process variation
KLA TENCOR CORP1 citations58
US10458777B2Oct 29, 2019
Polarization measurements of metrology targets and corresponding target designs
KLA TENCOR CORP0 citations52
US10025285B2Jul 17, 2018
On-product derivation and adjustment of exposure parameters in a directed self-assembly process
KLA TENCOR CORP0 citations52
US10401841B2Sep 3, 2019
Identifying registration errors of DSA lines
KLA TENCOR CORP0 citations51
US10331050B2Jun 25, 2019
Lithography systems with integrated metrology tools having enhanced functionalities
KLA TENCOR CORP0 citations51
US11158548B2Oct 26, 2021
Overlay measurement using multiple wavelengths
KLA TENCOR CORP0 citations46
US10504802B2Dec 10, 2019
Target location in semiconductor manufacturing
KLA TENCOR CORP0 citations46