Inventor
CHO TAE SEUNG
US20 patents
⚠️ This page may combine multiple inventors who share the name “CHO TAE SEUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
17 patentsUS9728437B2Aug 8, 2017
High temperature chuck for plasma processing systems
APPLIED MATERIALS INC123 citations98
US9117855B2Aug 25, 2015
Polarity control for remote plasma
APPLIED MATERIALS INC184 citations98
US9773648B2Sep 26, 2017
Dual discharge modes operation for remote plasma
APPLIED MATERIALS INC114 citations97
US10319649B2Jun 11, 2019
Optical emission spectroscopy (OES) for remote plasma monitoring
APPLIED MATERIALS INC8 citations84
US11594428B2Feb 28, 2023
Low temperature chuck for plasma processing systems
APPLIED MATERIALS INC9 citations83
US11361941B2Jun 14, 2022
Methods and apparatus for processing a substrate
APPLIED MATERIALS INC2 citations73
US10593560B2Mar 17, 2020
Magnetic induction plasma source for semiconductor processes and equipment
APPLIED MATERIALS INC3 citations73
US9874524B2Jan 23, 2018
In-situ spatially resolved plasma monitoring by using optical emission spectroscopy
APPLIED MATERIALS INC2 citations73
US11373845B2Jun 28, 2022
Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes
APPLIED MATERIALS INC2 citations68
US11915911B2Feb 27, 2024
Two piece electrode assembly with gap for plasma control
APPLIED MATERIALS INC1 citations62
US10699879B2Jun 30, 2020
Two piece electrode assembly with gap for plasma control
APPLIED MATERIALS INC1 citations62
US12009228B2Jun 11, 2024
Low temperature chuck for plasma processing systems
APPLIED MATERIALS INC0 citations60
US11901161B2Feb 13, 2024
Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes
APPLIED MATERIALS INC0 citations57
US10468285B2Nov 5, 2019
High temperature chuck for plasma processing systems
APPLIED MATERIALS INC0 citations52
US9528185B2Dec 27, 2016
Plasma uniformity control by arrays of unit cell plasmas
APPLIED MATERIALS INC1 citations52
US10920320B2Feb 16, 2021
Plasma health determination in semiconductor substrate processing reactors
APPLIED MATERIALS INC0 citations51
US12002659B2Jun 4, 2024
Apparatus for generating etchants for remote plasma processes
APPLIED MATERIALS INC0 citations39