Inventor
MESUDA MASAMI
JP17 patents
⚠️ This page may combine multiple inventors who share the name “MESUDA MASAMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSOH CORP
13 patentsUS11802049B2Oct 31, 2023
Gallium nitride-based sintered compact and method for manufacturing same
TOSOH CORP2 citations71
US12351455B2Jul 8, 2025
Gallium nitride particles and method for producing same
TOSOH CORP0 citations62
US12515952B2Jan 6, 2026
Gallium nitride particles and method for producing same
TOSOH CORP0 citations61
US12227830B2Feb 18, 2025
Yttrium ingot and sputtering target in which the yttrium ingot is used
TOSOH CORP0 citations60
US12410101B2Sep 9, 2025
Gallium nitride-based sintered body and method for manufacturing same
TOSOH CORP0 citations59
US12392025B2Aug 19, 2025
Method for producing chromium sintered body, method for producing sputtering target, and method for producing substrate with chromium film
TOSOH CORP0 citations58
US11168393B2Nov 9, 2021
Gallium nitride sintered body or gallium nitride molded article, and method for producing same
TOSOH CORP0 citations56
US12557567B2Feb 17, 2026
Laminated film, structure including laminated film, semiconductor element, electronic device, and method for producing laminated film
TOSOH CORP0 citations55
US12385126B2Aug 12, 2025
Sputtering target, method for producing same, and method for producing sputtering film using sputtering target
TOSOH CORP0 citations55
US12173398B2Dec 24, 2024
Cr—Si sintered body, sputtering target, and method for producing thin film
TOSOH CORP0 citations55
US12247297B2Mar 11, 2025
Multilayer film structure and method for producing same
TOSOH CORP0 citations54
US12241147B2Mar 4, 2025
Silicide-based alloy material and device in which the silicide-based alloy material is used
TOSOH CORP0 citations54
US12528711B2Jan 20, 2026
Powder of gallium nitride and method for producing the same
TOSOH CORP0 citations52
ITOH KENICHI
2 patentsUS8419400B2Apr 16, 2013
Sintered body, sputtering target and molding die, and process for producing sintered body employing the same
ITOH KENICHI7 citations79
US9920420B2Mar 20, 2018
Sintered body, sputtering target and molding die, and process for producing sintered body employing the same
ITOH KENICHI0 citations48